Mueller Matrix Ellipsometer MetronME
Ideaoptics' research-grade MetronME Mueller-matrix ellipsometer is a high-speed, precise, stable optical instrument based on multilayer-film interference and ellipsometry. It characterizes thickness and optical constants of transparent and semitransparent dielectric films and metal films, and optical constants of bulk materials. It also analyzes thicknesses of isotropic/anisotropic films, optical nanograting constants, and structures of one-/two-dimensional nanograting materials. Applications include semiconductors, LCD panels, solar cells, and optical coatings.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Instrument Configuration | Dual Rotating Compensator Type |
| Measurement Wavelength Range | Maximum Range 193-1690nm (Options:245-1000nm,193-1000nm,245-1690nm,193-1690nm) |
| Measurement Range | 1nm-10μm |
| Wavelength Interval [@VIS；@1000-1690nm] | ＜0.78nm @VIS, < 3.5nm @1000-1690nm |
| Measurement Parameters | Mueller Matrix, Psi&Delta, N&C&S, R&T, Rp/Rs, Tp/Ts, DOP |
| Large-Spot Dimensions | 1-8mm可调 |
| Microspot Size(Optional) | Optional 200μm or 80μm |
| Angle of Incidence | Fixed Angle 65° |
| Single-Measurement Time | ≤ 10s |
| Focusing Method | Optional Manual/Automatic Focusing |
| Heating/Cooling Stage ( Optional ) | -190℃ to 500℃ |
| Data Acquisition and Analysis Software | Supports multimode data acquisition and single-/multilayer film thickness measurement;Excel/TXT/CSV formats;hundreds of built-in optical constants for common semiconductors, dielectrics, metals, polymers, and oxides;user-defined material libraries and batch import;Tauc Lorentz, Cauchy, Sellmeier, Lorentz, and Drude dispersion models for fitting material optical constants;and anisotropic and depolarizing sample characterization. |
| Film Thickness Repeatability Accuracy(1s) [100nm Silicon-Based SiO₂ Film ,30 Measurements] | better than 0.005nm (100nm Silicon-Based SiO₂ Film ,30 Measurements ) |
| Refractive Index Repeatability Accuracy(1s) [100nm Silicon-Based SiO₂ Film ,n@633nm, 30 Measurements] | better than 0.0002 (100nm Silicon-Based SiO₂ Film ,n@633nm, 30 Measurements ) |
Applications
Key Features
Datasheet
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