Photomask Substrate
Photomask substrates are base materials for making photomasks. Depending on customer requirements, materials may include synthetic quartz, Schott B270i, soda-lime glass, ultra-clear glass or other specified materials. Precision finishing provides high flatness, high parallelism and high optical transmission, with no defects on the surface or inside the material. Applications include ICs (integrated circuits), FPDs (flat-panel displays), PCBs (printed circuit boards) and MEMS (microelectromechanical systems).
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Overview
Specifications
| Parameter | Value |
|---|---|
| Material | Synthetic quartz / Qingban glass / Schott B270i |
| Thickness [Source Table Group ①] | >0.3 mm |
| Total Thickness Variation TTV [Source Table Group ①] | <2 μm |
| Flatness [Source Table Group ①] | <2 μm |
| Surface Finish [Source Table Group ①] | Grade 0 Surface Finish / Zero Defect |
| Thickness [Source Table Group ②] | >0.8 mm |
| Total Thickness Variation TTV [Source Table Group ②] | <10 μm |
| Flatness [Source Table Group ②] | <10 μm |
| Surface Finish [Source Table Group ②] | MIL 60-40 |
Datasheet
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