Aligned Roller Nanoimprint Equipment
This roller nanoimprint system serves both research and volume production. High-precision alignment supports a wide range of high-aspect-ratio patterns, slanted gratings, micropillars, gratings, WGP and DOE structures.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Imprinting Method | UV Roller Imprinting |
| Substrate dimensions [Smaller Compatible Dimensions Customizable to Customer Requirements] | 8inch and 12inch compatibility; smaller sizes supported to customer requirements |
| Substrate thickness [Thickness Compatibility Customizable to Customer Requirements] | 0.3mm~3mm (thickness compatibility customizable) |
| Substrate material | Silicon wafers, quartz, glass, polymer sheets, and other substrate types |
| Daughterboard Type | PET Composite Mold |
| Master Material | Silicon Wafer , Metal , Quartz , Glass |
| Imprinted Line Width Range | 30nm~1000um |
| Aspect ratio | Max Meets 10:1 |
| Inter-Piece Dimensional Deviation | <3% |
| Dimensional Deviation from Master | <3% |
| Light Source | 365nm LED Light Source |
| Light Source - Max Power [Higher-Power Light Source Selectable to Product Requirements] | 500mw/cm^2 |
| Light Source-Power Adjustment Range | 1%~100% |
| Light Source - Cooling method [Selectable to Product Requirements] | Natural Cooling or Water Cooling (Selectable to Product Requirements) |
| Alignment-Positioning Method | Optical Alignment |
| Alignment | Automatic Recognition and Alignment |
| Alignment-Positioning Capability | ±2um |
| Platform Heating-Maximum Heating Temperature [Optional item] | Heating up to 85°C |
| Platform Heating-Temperature-Control Accuracy [Optional item] | ±1°C |
| Daughterboard Storage Unit | Stores 6 Daughterboards |
Key Features
Datasheet
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Supplier Information
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