Fully Automatic Nanoimprint Equipment
1. 8/12 compatibility: Easily exchange 8inch and 12inch substrates. 2. Modular design: Integrates EFEM, spin coater, HP, CP, NIL, Frame loading Unit, Pre-aligner and RF-reader. Additional submodules expand production capacity. 3. Precision: Minimum imprint linewidth 30nm; aspect ratio 10:1; dimensional deviation from master <3%; alignment accuracy ±2um. 4. Production: UPH 30 with excellent stability. 5. Fully automatic: Guangduo's in-house intelligent software automates all actions and provides real-time monitoring of key processes. 6. Cleanliness: Chamber environment reaches class 1; data deviation from master <3%; interwafer dimensional deviation <3%. Alignment/imprinting capability ≤2um. A precision stage provides stable alignment and eccentricity compensation.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Equipment Alignment and Imprinting Capability | ≤2um |
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