UltraField-Flat-Field Spectrometer
Full-band spectroscopy covers soft X-rays (SXR), extreme ultraviolet (EUV) and vacuum ultraviolet (VUV). A long-focal-length variable-line-spacing concave grating provides high-resolution flat-field spectroscopy across the full band, with online detection capability. Compatible sources include laser-produced plasma (LPP), discharge-produced plasma (DPP), high harmonics (HHG), free-electron lasers (FEL) and synchrotron radiation. It provides precise, efficient, multifunctional full-band analysis for advanced research and manufacturing.
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Overview
Full-band spectroscopy covers soft X-rays (SXR), extreme ultraviolet (EUV) and vacuum ultraviolet (VUV). A long-focal-length variable-line-spacing concave grating provides high-resolution flat-field spectroscopy across the full band, with online detection capability. Compatible sources include laser-produced plasma (LPP), discharge-produced plasma (DPP), high harmonics (HHG), free-electron lasers (FEL) and synchrotron radiation. It provides precise, efficient, multifunctional full-band analysis for advanced research and manufacturing.
Specifications
| Parameter | Value |
|---|---|
| Exit Focal Lengthh | 235 mm |
| Focal Plane Width [Customizable on Request] | >22 mm(Customizable on Request) |
| Siltwidth [Continuous adjustable] | 0 - 0.3 mm Continuous adjustable |
| Grating Size | 50 mm x 30 mm |
| Vacuum Compatible | Best afford 10⁻⁴ Pa |
| Number ofSwitchable Gratings [Expandable to a Maximum of 6 Boards] | 3 (Expandable to a Maximum of 6 Boards) |
| Wavelength Range [Customizable on Request] | 1-140 nm / 5-350 nm(Customizable on Request) |
| System Dimensions System Size | ≤660 mm x 320 mm x 400 mm |
Key Features
Full short-wave spectroscopy 1-350nm (VUV, EUV, SXR); in-situ switching up to 6 gratings without realignment/recalibration; high-resolution flat-field measurement down to 10 pm; accepts MCP, CCD, CMOS, TDI; up to 500000 frames with TDI camera; compatible with laser-produced plasma (LPP), discharge plasma (DPP), high harmonics (HHG), free-electron lasers (FEL), and synchrotron radiation.
Datasheet
Product Datasheet
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Supplier Information
Hefei Haoyu Xinguang Technology Co., Ltd. was founded in 2023, focusing on advanced laser applications and core semiconductor inspection & measurement technologies. It specializes in core components, instruments, and system development for the extreme ultraviolet (EUV) / vacuum ultraviolet (VUV) band. Co-founded by renowned EUV laser experts and industry veterans, the company is committed to customer-driven innovation and efficient service, aiming to become a world-leading advanced laser applications enterprise.
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