LH1000 Dual-Frequency Laser Interferometer
Dual-frequency laser interferometer for lithography machines: Builds multiaxis systems such as XY stages using a high-power, large-frequency-difference laser with direct linear-polarization output. It avoids nonlinear error from circular-to-linear polarization conversion. Higher power measures more displacement axes simultaneously, while larger frequency differences enable higher speed. Developed specifically for lithography, the precision system passed acceptance under China's major “Very-Large-Scale Integrated Circuit Manufacturing Technology and Complete Processes” project. A nonlinear high-precision measurement system provides greater accuracy. Any frequency difference within 1~20MHz can be supplied. Separate source and signal-receiver units simplify multiaxis assembly. Compact fiber receiving heads fit narrow spaces. Standard lithography-interferometer mounting dimensions and data interfaces enable direct replacement of existing products.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Frequency difference [±0.5; smaller frequency-difference ranges can be customized.] | 4.5±0.5 MHz |
| Min Output optical power | >500 μW |
| Spot size | 6, 9 mm |
| Frequency-Stabilization Accuracy | ±0.02 ppm |
Applications
Datasheet
Supplier Information
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