Ultralow-Absorption Antireflection Coating
The ultra-low-absorption antireflection coating is a high-performance optical coating technology designed for high-power laser systems. Its multilayer dielectric-film structure greatly reduces reflection and absorption losses at lens surfaces, achieving higher transmission.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Applicable wavelength | 10.6 μm, 9.3 μm, broadband 10.2–10.6 μm, and dual-band 10.6 μm + 632.8 nm / 650 nm options. |
| Absorption [@10.6 μm] | ≤0.1% |
| Single-Surface Reflectance [@10.6 μm] | <0.1% |
| Damage threshold （ Continuous Laser ） | ≥10000 W/cm² (specific test conditions confirmed per project) |
| Compatible Substrate Materials | ZnSe |
| Coating Stack Structure | Multilayer Composite Coatings (Design Optimizable to Project Requirements) |
| Operating temperature | -20 ℃ ~ 200 ℃ |
| Surface Quality | 40-20 S/D |
| Coating Method | Ion-Assisted Deposition (IAD) or Vacuum Evaporation |
Applications
Datasheet
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Supplier Information
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