HDSLM80R DC800
HDSLM80R-DC800 is optimized in response to feedback from quantum-research users. Its coating is specially designed around the 800nm absorption peak. A dielectric coating, in place of conventional aluminum, raises reflectivity within the wavelength range to as high as 92%. A carefully designed water-cooling structure improves thermal stability 10-fold. Applications include optogenetics, biological imaging, diamond cutting, special-material processing, quantum precision measurement, optical-field control, atom manipulation, particle trapping and optical tweezers. ◆ Dielectric coating process. ◆ Analog driver circuit. ◆ Distinctive structural design. ◆ Iterative development for quantum research. ◆ Reflectivity up to 92%. ◆ 10-fold improvement in thermal stability.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Modulation Type | Phase type |
| Pixel size | 8μm |
| Resolution | 1920*1200 |
| Reflectance | Typ：89%；Max：92% |
| Applicable wavelength | 800±30nm |
| Diffraction Efficiency [16 Levels] | 85% |
| Phase Capability [@808nm] | 2.39π@808nm |
| Phase Stability | ~0.003π |
| Phase Linearity | R²>99.98% |
| Damage threshold | 100W/cm² |
| Data Bit depth | 8bit / 10bit |
Datasheet
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