Laser Direct Writing Lithography Lens
Laser Direct Writing (abbreviated as LDW), also called Laser Direct Imaging (abbreviated as LDI), is a technology that uses a computer to control high-precision laser beam scanning to directly expose and write any designed pattern on photoresist. The chrome glass mask used in traditional lithography processes needs to be provided by professional suppliers, but in R&D environments, the mask design needs to change frequently. Laser direct writing lithography uses a computer to control the on/off of a series of laser pulses, directly exposing and drawing the desired pattern on the photoresist. Current technology is mainly applied in industries such as PCB circuit board printing, solder mask ink printing, and IC substrate printing. In laser direct writing systems, the lens (usually referring to the projection lithography objective) plays a key role, responsible for focusing the laser beam and accurately projecting it onto the target substrate. Laser direct writing lithography lenses need to meet requirements such as high precision, high resolution, and good optical performance to ensure that the laser beam can be accurately projected onto the target position and produce clear, precise patterns. The design and manufacturing process of the lens needs to consider multiple factors, including material selection, optical design, processing precision, and assembly and adjustment. For laser direct writing lithography systems, Wavelength Opto-Electronic has conducted long-term research and development and experiments, and has successively successfully developed products such as direct writing lithography illumination lenses and imaging lenses of different magnifications, and simultaneously developed integrated opto-mechanical modules, contributing to the development of the lithography machine field.
Overview
Specifications
| Parameter | Value |
|---|---|
| Direct Writing Lithography Illumination Lens - Wavelength | 350~450 nm |
| Direct Writing Lithography Illumination Lens - Illumination Uniformity | > 98 % |
| Direct Writing Lithography Illumination Lens - Energy Utilization Rate | > 96 % |
| Direct Writing Lithography Illumination Lens - Applicable Fiber - NA | 0.22±0.02 |
| Direct Writing Lithography Illumination Lens - Applicable Fiber - Aperture | < 2*4 |
| Direct Writing Lithography Illumination Lens - Dimensions | 200 mm *φ45 mm |
Key Features
Datasheet
Please provide your email to download the datasheet.
Invalid email format. Please try again.
Supplier Information
Loading...
Name
Phone
Organization
Use Case

Database Platform