UVLED Parallel Exposure Light Source (UVLED-365-6-400-WC/AC)
UV light source for lithography machines, which through special optical design emits UV parallel light close to parallel light, so that ultraviolet light of a specific band passes through the mask openings to complete the etching, exposure and development of high-precision circuit lines of integrated circuits. The functions of the exposure system mainly include: smoothing diffraction effects, achieving uniform illumination, light filtering and cold light processing, achieving strong light illumination and light intensity adjustment, etc. Wavelength Optoelectronics provides two types of lithography machine exposure light sources for the semiconductor industry: mercury lamp parallel light sources and LED parallel light sources. Among them, the cold light source characteristics of the LED UV light source also avoid the inflation of the film, greatly improving its yield.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Light source | LED |
| Operating Wavelength [customizable 405nm, 435nm or mixed bands] | Dominant Wavelength 365 nm (customizable 405 nm, 435 nm or mixed bands) |
| Illumination size [Customizable 4-inch--19-inch exposure area] | >160 mm x160mm (customizable 4-inch--19-inch exposure area) |
| Illumination Non-uniformity | <2 % |
| Illumination intensity [365nm; air-cooled/water-cooled; 365nm (air-cooled)/>100mw/cm²@365nm (water-cooled)] | >30mw/cm²@365 nm (air-cooled)/>100mw/cm²@365 nm (water-cooled) |
| Collimation Angle [Customizable] | <2 ° (customizable) |
| Tilt Angle | <0.3 ° |
| Working Distance [can be customized according to customer requirements] | 200-400mm (can be customized according to customer requirements) |
| Dimensions | Length×Width×Height ≤550 mm *350 mm *600 mm |
| Energy Adjustment [local or remote] | Adjust and control LED power (local or remote) |
| Energy Detection | Real-time Monitoring of Optical Path Energy |
Applications
Datasheet
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Supplier Information
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