193nm low-order waveplate
The 193nm low-order waveplate achieves high-amplitude phase retardation by optimizing the birefringent material specifically for deep ultraviolet wavelengths and combining it with an ion beam fine-tuning process. Its core advantages include high retardation precision with a phase error <±1% at a wavelength of 193nm — the application of ion beam fine-tuning technology greatly reduces microscopic deviations in the material's optical thickness, thereby providing more precise polarization control for deep ultraviolet laser systems such as excimer lasers. Its compact structure requires no complex cascaded design, making it very suitable for integrated deep ultraviolet optical modules in lithography systems; its relatively high laser damage threshold (>5 J/cm^2 @ 193nm) ensures its reliability in high-power deep ultraviolet applications, while the ultra-smooth surface formed by ion beam fine-tuning further reduces the risk of local energy concentration under high-energy laser irradiation. In deep ultraviolet spectral polarization measurement systems, the stable phase retardation ensured by ion beam fine-tuning controls the polarization degree measurement error to within 2%, providing convenience for high-precision polarization analysis in scenarios such as photoresist characterization and atmospheric ozone layer spectral analysis.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Material | Quartz crystal |
| Diameter Tolerance | +0.0, -0.1mm |
| Wavefront Distortion | λ/8 @ 632.8nm |
| Delay Accuracy | λ/50 |
| Parallelism | <1″ |
| Technical indicator photopurity | 20/10 |
| Optical Aperture | >90% |
| Coating | Uncoated or custom coating as required |
| Standard Wavelength | 193.368nm |
Datasheet
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