Lithography Wafer
Lithography Wafer_Semiconductor Applications_Products_Zhejiang Lante Optics Co., Ltd. Process Capability and Accuracy Photoresist coating Spin coating Thickness accuracy ≤3% (for flat surfaces) Spray coating Thickness accuracy ≤10% (for flat/convex-concave surfaces) Lithography Accuracy 2um Overlay accuracy: 0.15um Development Accuracy 2um Development uniformity <5% Etching Dimensional variation ±1um Lithography Wafer_Semiconductor Applications_Products_Zhejiang Lante Optics Co., Ltd. Lante Optics LANTE OPTICS About Us Company Profile Chairman's Message Corporate Culture Development History Corporate Honors Products Traditional Optics Prisms Lenses Filters Optical Communications Medical Applications Micro Prisms Micro Glass Spherical/Aspherical Lenses Automotive Applications Automotive Rearview Mirror Applications Logo Projection Lamp Applications Vehicle-Mounted Lens Applications Semiconductor Applications Substrate Wafers Carrier Wafers Packaging Wafers Through-Glass-Via Wafers (TGV) Lithography Wafers Consumer Electronics Micro Prisms Small Lenses PBS Prisms Lithography Glass Precision Glass Molding Glass Aspherical Lenses Laser Collimating Lenses FAC Lenses 5G Optical Communication Lenses Lens Design & Assembly Vehicle-Mounted Lenses Projection Lenses TOF Lenses Low-Light Lenses Special-Industry Lenses MLA Microlens Array MLA Microlens Array - Welcome Light Carpet / Lightcarpet MLA Microlens Array - Headlamps / Headlamps MLA Microlens Array - Ambient Light / Interior Projection MLA Microlens Array - Safety Indication Projection System / Safety Projection Technical Strength Production Equipment Inspection Equipment Environmental Test Equipment Research & Development Innovation Achievements News Center Company News Company Announcements Industry News Group Announcements Talent Recruitment Talent Philosophy Work Environment Job Openings Investor Relations Investor Relations Management Real-Time Quotes Company Announcements Interactive Platform Contact Us Contact Information Message Feedback Chinese ENGLISH Chinese ENGLISH 01 About Us Company Profile Chairman's Message Corporate Culture Development History Corporate Honors 02 Products Traditional Optics Optical Communications Medical Applications Automotive Applications Semiconductor Applications Consumer Electronics Precision Glass Molding Lens Design & Assembly MLA Microlens Array 03 Technical Strength Production Equipment Inspection Equipment Environmental Test Equipment Research & Development Innovation Achievements 04 News Center Company News Company Announcements Industry News Group Announcements 05 Talent Recruitment Talent Philosophy Work Environment Job Openings 06 Investor Relations Investor Relations Management Real-Time Quotes Company Announcements Interactive Platform 07 Contact Us Contact Information Message Feedback Website Home About Us Company Profile Chairman's Message Corporate Culture Development History Corporate Honors Products Traditional Optics Optical Communications Medical Applications Automotive Applications Semiconductor Applications Consumer Electronics Precision Glass Molding Lens Design & Assembly MLA Microlens Array Technical Strength Production Equipment Inspection Equipment Environmental Test Equipment Research & Development Innovation Achievements News Center Company News Company Announcements Industry News Group Announcements Talent Recruitment Talent Philosophy Work Environment Job Openings Investor Relations Investor Relations Management Real-Time Quotes Company Announcements Interactive Platform Contact Us Contact Information Message Feedback ENGLISH Website Home > Products > Semiconductor Applications > Lithography Wafer Lithography Wafer "> Lithography Wafer "> Technical Specifications Display Process Capability and Accuracy Photoresist Coating Spin Coating Thickness Accuracy ≤3% (for flat surfaces) Photoresist Coating Spray Coating Thickness Accuracy ≤10% (for flat/convex-concave surfaces) Lithography Accuracy 2um Overlay Accuracy: 0.15um Development Accuracy 2um Development Uniformity <5% Etching Dimensional Variation ±1um Product Inquiry Name: Tel: Email: Inquiry Content: Can't read, try another * Please fill in the form carefully. Inquiry responses are handled during working hours: Monday to Friday, 9:00 to 18:00. Please wait patiently for our reply. About Us Company Profile Chairman's Message Corporate Culture Development History Corporate Honors Products Traditional Optics Optical Communications Medical Applications Automotive Applications Semiconductor Applications Consumer Electronics Precision Glass Molding Lens Design & Assembly MLA Microlens Array Technical Strength Production Equipment Inspection Equipment Environmental Test Equipment Research & Development Innovation Achievements News Center Company News Company Announcements Industry News Group Announcements Talent Recruitment Talent Philosophy Work Environment Job Openings Investor Relations Investor Relations Management Real-Time Quotes Company Announcements Interactive Platform Contact Us Contact Information Message Feedback Lante Optics LANTE OPTICS WeChat Official Account Official Mobile Site COPYRIGHT 2020 Zhejiang Lante Optics Co., Ltd. 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Overview
Specifications
| Parameter | Value |
|---|---|
| Photoresist Spin Coating | Adhesive thickness accuracy ≤3% (applicable to flat surfaces) |
| Photoresist Spray Coating | Adhesive thickness accuracy ≤10% (applicable to flat/convex/concave surfaces) |
| Lithography | Accuracy 2 um, registration accuracy: 0.15 um |
| Development | Accuracy 2 um, development uniformity <5% |
| Etching | Dimension variation ±1um |
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