Z-Axis Vertical Lift Stage

Z-Axis Vertical Lift Stage

Supplier
Cnbhc
Part Number
REI130V
Category
Motorized Platform
Origin
China

The REI_V series nano vertical lift stage is a standardized, modular, wedge-type high-precision vertical lift platform. Driven by coreless linear motors with precision crossed-roller guidance, it combines speed, accuracy, system resolution, bi-directional repeatability, reliability and compact size. As a derivative of the REI series, it delivers the same motion performance as the REI_LM series and is the ideal Z-axis choice for space-constrained applications. The non-contact direct drive offers high dynamic performance, zero cogging, sub-nanometer resolution, extremely low velocity ripple, high speed and high accuracy; the stage features zero backlash and near-zero system hysteresis, enabling precise, highly repeatable nanometer-level motion as well as extremely low-speed smooth motion.

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Overview

The REI_V series nano vertical lift stage is a standardized, modular, wedge-type high-precision vertical lift platform. Driven by coreless linear motors with precision crossed-roller guidance, it combines speed, accuracy, system resolution, bi-directional repeatability, reliability and compact size. As a derivative of the REI series, it delivers the same motion performance as the REI_LM series and is the ideal Z-axis choice for space-constrained applications. The non-contact direct drive offers high dynamic performance, zero cogging, sub-nanometer resolution, extremely low velocity ripple, high speed and high accuracy; the stage features zero backlash and near-zero system hysteresis, enabling precise, highly repeatable nanometer-level motion as well as extremely low-speed smooth motion.

Specifications

ParameterValue
Travel5mm
Accuracy (EC)<350nm
Accuracy (Base)<250nm
Accuracy (Plus)<200nm
Resolution (EC)1Vpp Sin/Cos(20um/16384)=1.2nm
Resolution (Base)1Vpp Sin/Cos(20um/65536)=0.3nm
Resolution (Plus)1Vpp Sin/Cos(20um/65536)=0.3nm
Min. Incremental Motion (EC)10nm
Min. Incremental Motion (Base)3nm
Min. Incremental Motion (Plus)2nm
Bi-Directional Repeatability (EC)<250nm
Bi-Directional Repeatability (Base)<250nm
Bi-Directional Repeatability (Plus)<175nm
Straightness<1.5um
Flatness<2.5um
Roll8 arc secarc sec
Yaw5 arc secarc sec
Maximum Speed (Upper Axis)100mm/s
Maximum Acceleration (No Load)0.8g
Maximum Force (Continuous)97N
Load Capacity (Vertical)3kg
Moving Mass1kg
Stage Mass2.95kg

Key Features

Nanopositioning performance with 3-10 mm vertical travel; bi-directional repeatability up to <200 nm, positioning accuracy <300 nm; control resolution better than 0.3 nm; excellent positioning capability (steady-state error) better than 2 nm; high-rigidity crossed-roller bearing system with outstanding dynamic response; non-contact direct drive with zero cogging and sub-nanometer resolution; standardized universal mounting pattern for flexible 2-axis, 3-axis or multi-axis configuration

Datasheet

Product Datasheet
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Supplier Information

<p>Sichuan Borui Huaxin Technology Co., Ltd. (CNBHC) is committed to providing ultra-precision motion control core subsystems for ultra-precision machine tools, free-form mask direct writing, lithography direct writing, wafer dicing, wafer defect inspection, ultrafast wafer microscopy, micro-nano manufacturing, high-precision packaging testing, metrology, and other fields. CNBHC adheres to international standards such as GB17421, ISO230-2, and VDI3441, striving to deliver continuous, stable, and high-quality products and services. The company upholds the mission of 'Pursue Excellent Quality, Create National Brand', insisting on basic research and inheriting the spirit of craftsmanship to advance the honor of Chinese manufacturing.</p>

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Z-Axis Vertical Lift Stage
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