Genesis ALD
Genesis ALD is a roll-to-roll atomic layer deposition system designed for high-quality ALD thin film deposition on flexible substrates, making it an ideal choice for various functional applications.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Process Type | Spatial Thermal ALD |
| Substrate Type | Polymer |
| Substrate Type | steel |
| Substrate Type | glass |
| Substrate Type | stainless steel |
| Substrate Type | flexible substrates |
| Roll Speed | Production Minimum 0.1m/min, Production Maximum 20m/min |
| Dynamic Deposition Rate | 10nm*m/min (Al2O3) |
| Film Thickness Uniformity | Minimum 100nm |
| Maximum Process Temperature | 250°C |
| Equipment Dimensions | 2060×2340×2150mm |
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Key Features
Datasheet
Supplier Information
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