P Series ALD Platform
The P Series is an industrial-scale ALD platform designed for batch production. It features large reaction chambers for high-volume thin film deposition, ensuring uniformity and compatibility with various substrates and thicknesses.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Process Type | Thermal ALD |
| Process Temperature Range | 25-550°C |
| Substrate Type | Silicon wafers, glass, metal materials, polymer 3D substrates |
| Vacuum Chamber Size P400A | ø400mm |
| Vacuum Chamber Size P800 | ø800mm |
| Vacuum Chamber Size P1500 | ø1700mm |
| Reaction Chamber Loading and Size P400A | 240×240×720mm with 23 shelf cassette, 370×470×25mm with 2 shelf cassette |
| Reaction Chamber Loading and Size P800 | 550×310×700mm, 380×380×900mm, 730×1200×10mm |
| Reaction Chamber Loading and Size P1500 | 1300×2400×750mm |
| Precursor Volume P400A | 5 standard cylinders, maximum volume 5×10L |
| Precursor Volume P800 | 5 standard cylinders, maximum volume 5×10L |
| Precursor Volume P1500 | Maximum volume 7×16.2L |
| Equipment Dimensions P400A | 2400×930×2420mm |
| Equipment Dimensions P800 | 3200×1340×2460mm |
| Equipment Dimensions P1500 | 6195×2480×2600mm |
Applications
Key Features
Datasheet
Supplier Information
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