56°-266nm Polarizing Beam-Splitting Coating
宏策光电56°-266nm DUV Polarizing Splitter,P High-T/S High-R,High Extinction/Low Loss,Special Dense UV-Resistant Dielectrics/High Damage Threshold for Stable High-Power Pulsed Polarization Control.
Specification Snapshot
Substrate
Quartz, Calcium Fluoride CaF2 and Other Materials
Threshold [266nm]
>8W/cm²@266nm
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Overview
宏策光电56°-266nm DUV Polarizing Splitter,P High-T/S High-R,High Extinction/Low Loss,Special Dense UV-Resistant Dielectrics/High Damage Threshold for Stable High-Power Pulsed Polarization Control.
Specifications
| Parameter | Value |
|---|---|
| Substrate | Quartz, Calcium Fluoride CaF2 and Other Materials |
| Dimensions / Angle | Customer Customization |
| Spectrum Rs [56° incidence; 266nm] | Rs>99.5%@266nm |
| Spectrum Rp [56° incidence; 532nm] | Rp<0.1%@532nm |
| Threshold [266nm] | >8W/cm²@266nm |
Applications
266nm Deep-UV Polarization Splitting, Isolation and Precision Spectral Analysis for Wide-Angle Polarization Control
Datasheet
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Supplier Information
Suzhou Hongce Optoelectronics Technology Co., Ltd., founded in August 2015, specializes in the R&D and production of precision optical nano-film devices and PVD coating equipment, covering wavelength ranges from infrared to X-ray and neutron optics, providing one-stop solutions. The company has mastered core technologies in short-wavelength optics such as EUV and X-ray, achieving domestic substitution. With multiple coating and testing equipment, it holds over 40 intellectual properties. Products include DUV/EUV lithography thin-film devices, laser films, multilayer Laue lenses (MLL), X-ray detection crystals, serving major national scientific platforms like lithography, synchrotron radiation, and elemental analysis.
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