ME-210 High Speed Ellipsometer

ME-210 High Speed Ellipsometer

Supplier
Oelectron
Category
Optical Metrology
Origin
China

Conventional ellipsometers measure one point at a time, so mapping film thickness uniformity across a surface takes N hours. The minimum measurement resolution is also limited by the laser spot size, preventing film thickness mapping in very small regions. ME-210 overcomes both limitations using a proprietary microscopic polarization array, or photonic crystal.

Specification Snapshot
Light Source
Semiconductor Laser ( Wavelength 636nm)
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Overview

Conventional ellipsometers measure one point at a time, so mapping film thickness uniformity across a surface takes N hours. The minimum measurement resolution is also limited by the laser spot size, preventing film thickness mapping in very small regions. ME-210 overcomes both limitations using a proprietary microscopic polarization array, or photonic crystal.

Specifications

ParameterValue
Angle of Incidence70 °
Thin Film thickness repetition Accuracy [Standard deviation of 100 repeated measurements at one point on an approximately 100nm SiO2 film on Si]0.1 nm
Refractive Index Repeatability [Standard deviation of 100 repeated measurements at one point on an approximately 100nm SiO2 film on Si]0.001
Measurement speed [Wide Area mode ;100mm Square Shaped Area Measurement]≥900 Point / Minutes
Measurement speed [High Definition mode ;1mm Square Shaped Area Measurement]≥5000 Point / Minutes
Light SourceSemiconductor Laser ( Wavelength 636nm)
Measurement Point Dimensions [Wide Area mode]0.5 mm
Measurement Point Dimensions [High Definition mode]5.5 μm

Key Features

Rapid film thickness mapping on substrates up to 12inch; high resolution mapping of small regions with instrument resolution of 5.5μm×5.5μm; software simulation compares simulated and measured values to evaluate film formation processes; film thickness measurement on transparent substrates.

Datasheet

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Supplier Information

Oe
Oelectron
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Beijing Optic Electronic Technology Co., Ltd. (Optic Electronic) was founded in 2010. It is a high-tech enterprise focusing on the optoelectronic field, providing domestic scientific research institutions and industrial users with instruments, equipment and overall solutions in optical inspection, micro-nano processing, laser applications and other fields. The company is headquartered in Changping, Beijing, with offices in Shanghai and Guangzhou, serving the whole country. Beijing Optic Electronic Technology Co., Ltd. (Optic Electronic) was founded in 2010 and has been deeply engaged in the optoelectronic field for more than ten years, focusing on introducing and promoting mature and innovative optoelectronic technologies and reliable products from overseas, and providing professional instruments, equipment and supporting services for domestic scientific research institutions and industrial enterprises. Its products cover optical inspection and analysis, laser and micro-nano processing, semiconductor packaging inspection, physical property analysis, and special optical fibers and crystals, and are widely used in semiconductor manufacturing, materials science, biomedicine, university research and national defense.

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ME-210 High Speed Ellipsometer
Oelectron · Optical Metrology
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