High-Power Laser-Line Mirror, Material: UVFS OMLHP10-532&1064
JCOPTIX high-power line mirrors cover 1064nm and 532&1064nm. High-purity UV fused silica with ultrahigh-LIDT dielectric coatings handles energetic pulses for micromachining/materials processing. Efficient single-wavelength reflection, polished or ground rears, 0-45° incidence and reflectivity 99% or higher. JCOPTIX offers varied precision substrates and custom dimensions/coating materials.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Optical element material | UV Fused Silica |
| Diameter | 25.4 mm |
| Clear Aperture Dimension | >85%CA |
| Design Wavelength | 532 & 1064 nm |
| Thickness | 6 mm |
| Coating | Laser-Induced Damage Threshold (LIDT) Dielectric Coating |
| Reflection Rₛ / Rₚ [532 & 1064 nm] | Rₛ, Rₚ >99% @ 532 & 1064 nm |
| Angle of incidence (AOI) | 0-45° |
| Damage Threshold [532 nm / 1064 nm，10 ns，20 Hz] | 8 J/cm²，532 nm，10 ns，20 Hz; 30 J/cm²，1064 nm，10 ns，20 Hz |
| Thickness Tolerance | ± 0.25 mm |
| Diameter Tolerance | +0.0/-0.1 mm |
| Surface Flatness [@633 nm] | λ/10 |
| Surface quality (scratch/dig) | 40/20 |
| Surface parallelism | < 3 arcmin |
| Rear Surface Finish | Ground |
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Datasheet
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