Ultrafast Mirror, Material: UVFS OMU05-F2S2&F4S2
Low-GDD ultrafast mirrors use multilayer dielectric coatings optimized for minimum group-delay dispersion and maximum reflection in specific laser bands, suiting ultrafast transport. High-purity synthetic amorphous fused silica offers low expansion, good optics and high damage threshold for energetic ultrashort pulses. Contact technical support for other wavelength ranges.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Optical element material | UV Fused Silica |
| Diameter | 12.7 mm |
| Clear Aperture Dimension | > 85% of Diameter |
| Operating Wavelength | 1000-1070 nm & 500-540 nm |
| Coating | Low-Group-Delay-Dispersion Dielectric Coating |
| Reflection Rs / Rp [500-540 nm / 507-527 nm / 1000-1070 nm / 1005-1070 nm；AOI=45°] | Rs > 99.9% (@ 500-540 nm),; Rp > 99.8% (@ 507-527 nm),; Rs > 99.9% (@ 1000-1070 nm),; Rp > 99.8% (@ 1005-1070 nm), AOI=45° |
| Thickness | 6.0 mm |
| Diameter Tolerance | +0.0/-0.1 mm |
| Thickness Tolerance | ±0.1 mm |
| Surface flatness [@633 nm] | λ/8 |
| Surface quality (scratch/dig) | 40/20 |
| Angle of incidence (AOI) | 45° |
| Group Delay Dispersion GDDs / GDDp [500-540 nm / 510-525 nm / 1000-1070 nm / 1010-1055 nm；AOI=45°] | Group delay dispersion: |GDDs| < 35 fs² (@ 500-540 nm), |GDDp| < 50 fs² (@ 510-525 nm), |GDDs| < 20 fs² (@ 1000-1070 nm), |GDDp| < 40 fs² (@ 1010-1055 nm), AOI=45° |
| Rear Surface | Polished |
| Surface parallelism [@633 nm] | < 10 arcsec |
Key Features
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