Arbitrary Pattern Generating Plate

Arbitrary Pattern Generating Plate

Supplier
Zhilanweina
Category
Beam Shapers
Origin
China

Beam shapers, also called beam converters, control optical fields. Phase modulation, amplitude control, or geometric optical-path transformations redistribute laser intensity and wavefront phase, changing spot geometry into a target profile for processing, illumination, or inspection. An arbitrary-pattern generator is a typical beam shaper. Definition: this diffractive element uses computer-generated holography and micro/nanolithography to form micrometer-scale binary/multilevel phase-relief structures on a substrate. Diffraction reconstructs a designed arbitrary two-dimensional spot pattern at a specified working distance; see the illustrated results. Key parameters: 2. Input specifications: (1) collimated Gaussian or flat-top beam; (2) input spot diameter; (3) normal or oblique incidence. 3. Working distance, the nominal distance for sharp target imaging. 4. Diffraction efficiency: 2-level binary phase, 60%–75%; 4-level phase, 80%–88%; 8-/16-level phase, at least 92%. More levels produce cleaner outlines and less stray light. 6. Zero order, the inherent directly transmitted spot, can be reduced by algorithm optimization. Working principles: 1. Calculate the required phase using angular-spectrum theory and Gerchberg–Saxton (GS) iteration from the target pattern. 2. Discretize continuous phase into multilevel relief, with 2-, 4-, 8-, or 16-level phase. 3. Lithography and etching form microstructures on quartz or optical-glass substrates. 4. Normally incident collimated laser light receives the preset phase modulation. 5. Diffraction/interference during propagation forms the target pattern. Customization/manufacturing: the company describes itself as an early Chinese optical-design/manufacturing enterprise with over twenty years of experience, a professional team, and mature engineering practice. A complete scalar-diffraction design system performs target-specific simulation/optimization, solves field propagation, and finely controls phase/amplitude for effective laser shaping. In-house high-precision lithography and dry etching independently manufacture these elements. Custom 2/4/8/16-level structures have micrometer features, low geometric distortion, good imaging contrast, and strong stray-light/artifact suppression. Diffraction efficiency reaches 92%, with high energy utilization and good reproduction of custom patterns. Fused silica, silicon, germanium, and ZnSe cover UV, visible, near IR, and far IR. Wavelength-specific antireflection coatings combine relatively high laser-damage thresholds and good high/low-temperature and aging resistance, maintaining stability in complex conditions. The company controls simulation, GS phase optimization, customized patterns, precision processing, and mass-production inspection. It supports small research/university orders and stable high-volume industrial supply with short lead times, addressing custom patterns, precision field control, and laser shaping. Reliable pattern replication, shaping, light utilization, and environmental adaptability support applications in 3D structured-light vision, precision machine-vision inspection, laser alignment marks, industrial contour preprojection, research field-control experiments, laser ambient lighting, automated smart sensing, and precision laser processing. The source reports broad customer trust. Contact the company for custom work and professional, efficient technical/product support. Image captions: left to right, rectangular and annular spots; left to right, text-pattern spot and square cross alignment spot.

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Overview

Beam shapers, also called beam converters, control optical fields. Phase modulation, amplitude control, or geometric optical-path transformations redistribute laser intensity and wavefront phase, changing spot geometry into a target profile for processing, illumination, or inspection. An arbitrary-pattern generator is a typical beam shaper. Definition: this diffractive element uses computer-generated holography and micro/nanolithography to form micrometer-scale binary/multilevel phase-relief structures on a substrate. Diffraction reconstructs a designed arbitrary two-dimensional spot pattern at a specified working distance; see the illustrated results. Key parameters: 2. Input specifications: (1) collimated Gaussian or flat-top beam; (2) input spot diameter; (3) normal or oblique incidence. 3. Working distance, the nominal distance for sharp target imaging. 4. Diffraction efficiency: 2-level binary phase, 60%–75%; 4-level phase, 80%–88%; 8-/16-level phase, at least 92%. More levels produce cleaner outlines and less stray light. 6. Zero order, the inherent directly transmitted spot, can be reduced by algorithm optimization. Working principles: 1. Calculate the required phase using angular-spectrum theory and Gerchberg–Saxton (GS) iteration from the target pattern. 2. Discretize continuous phase into multilevel relief, with 2-, 4-, 8-, or 16-level phase. 3. Lithography and etching form microstructures on quartz or optical-glass substrates. 4. Normally incident collimated laser light receives the preset phase modulation. 5. Diffraction/interference during propagation forms the target pattern. Customization/manufacturing: the company describes itself as an early Chinese optical-design/manufacturing enterprise with over twenty years of experience, a professional team, and mature engineering practice. A complete scalar-diffraction design system performs target-specific simulation/optimization, solves field propagation, and finely controls phase/amplitude for effective laser shaping. In-house high-precision lithography and dry etching independently manufacture these elements. Custom 2/4/8/16-level structures have micrometer features, low geometric distortion, good imaging contrast, and strong stray-light/artifact suppression. Diffraction efficiency reaches 92%, with high energy utilization and good reproduction of custom patterns. Fused silica, silicon, germanium, and ZnSe cover UV, visible, near IR, and far IR. Wavelength-specific antireflection coatings combine relatively high laser-damage thresholds and good high/low-temperature and aging resistance, maintaining stability in complex conditions. The company controls simulation, GS phase optimization, customized patterns, precision processing, and mass-production inspection. It supports small research/university orders and stable high-volume industrial supply with short lead times, addressing custom patterns, precision field control, and laser shaping. Reliable pattern replication, shaping, light utilization, and environmental adaptability support applications in 3D structured-light vision, precision machine-vision inspection, laser alignment marks, industrial contour preprojection, research field-control experiments, laser ambient lighting, automated smart sensing, and precision laser processing. The source reports broad customer trust. Contact the company for custom work and professional, efficient technical/product support. Image captions: left to right, rectangular and annular spots; left to right, text-pattern spot and square cross alignment spot.

Specifications

ParameterValue
Design Wavelength193 nm UV to 10.6 μm Infrared
Input Beam Specifications - Input Beam TypeCollimated Gaussian Beam/Flat-Top Beam
Input Beam Specifications - Incidence MethodNormal Incidence/Oblique Incidence
Substrate MaterialFused Silica, Silicon, Germanium, Zinc Selenide

Applications

Flat-top generation, laser homogenization and output shaping use phase solutions based on target optical-field distributions. Multispot splitting and beam arrays use multilevel phase discretization for precise allocation. Precision 3D structured-light projection and industrial profiling use lithographically etched microstructures. Machine-vision positioning, fixture reference lines and laser alignment use custom phase modulation. LOGO projection, research holography and optical micromanipulation use diffraction/interference to form target fields remotely.

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Supplier Information

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Zhilanweina
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Chengdu Zhilan Micro-Nano Technology Co., Ltd. focuses on micro-nano optics, engaging in the design, fabrication, and application of micro-nano optical structures. The company masters continuous-surface micro-optical element processing technology based on grayscale modulation, capable of designing high-performance microlens arrays, diffractive optical elements (DOE), complex field modulation elements, etc. Products include microlens arrays, phase plates, DOEs, gratings, photomasks, etc., which have been applied in space exploration, 3D imaging, optoelectronic measurement, smart home, human-computer interaction, and other fields, cooperating with nearly a hundred domestic institutions. Adhering to the principle of customer first, the company provides professional services in optical design, component processing, system integration, etc.

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