Arbitrary Pattern Generating Plate
Beam shapers, also called beam converters, control optical fields. Phase modulation, amplitude control, or geometric optical-path transformations redistribute laser intensity and wavefront phase, changing spot geometry into a target profile for processing, illumination, or inspection. An arbitrary-pattern generator is a typical beam shaper. Definition: this diffractive element uses computer-generated holography and micro/nanolithography to form micrometer-scale binary/multilevel phase-relief structures on a substrate. Diffraction reconstructs a designed arbitrary two-dimensional spot pattern at a specified working distance; see the illustrated results. Key parameters: 2. Input specifications: (1) collimated Gaussian or flat-top beam; (2) input spot diameter; (3) normal or oblique incidence. 3. Working distance, the nominal distance for sharp target imaging. 4. Diffraction efficiency: 2-level binary phase, 60%–75%; 4-level phase, 80%–88%; 8-/16-level phase, at least 92%. More levels produce cleaner outlines and less stray light. 6. Zero order, the inherent directly transmitted spot, can be reduced by algorithm optimization. Working principles: 1. Calculate the required phase using angular-spectrum theory and Gerchberg–Saxton (GS) iteration from the target pattern. 2. Discretize continuous phase into multilevel relief, with 2-, 4-, 8-, or 16-level phase. 3. Lithography and etching form microstructures on quartz or optical-glass substrates. 4. Normally incident collimated laser light receives the preset phase modulation. 5. Diffraction/interference during propagation forms the target pattern. Customization/manufacturing: the company describes itself as an early Chinese optical-design/manufacturing enterprise with over twenty years of experience, a professional team, and mature engineering practice. A complete scalar-diffraction design system performs target-specific simulation/optimization, solves field propagation, and finely controls phase/amplitude for effective laser shaping. In-house high-precision lithography and dry etching independently manufacture these elements. Custom 2/4/8/16-level structures have micrometer features, low geometric distortion, good imaging contrast, and strong stray-light/artifact suppression. Diffraction efficiency reaches 92%, with high energy utilization and good reproduction of custom patterns. Fused silica, silicon, germanium, and ZnSe cover UV, visible, near IR, and far IR. Wavelength-specific antireflection coatings combine relatively high laser-damage thresholds and good high/low-temperature and aging resistance, maintaining stability in complex conditions. The company controls simulation, GS phase optimization, customized patterns, precision processing, and mass-production inspection. It supports small research/university orders and stable high-volume industrial supply with short lead times, addressing custom patterns, precision field control, and laser shaping. Reliable pattern replication, shaping, light utilization, and environmental adaptability support applications in 3D structured-light vision, precision machine-vision inspection, laser alignment marks, industrial contour preprojection, research field-control experiments, laser ambient lighting, automated smart sensing, and precision laser processing. The source reports broad customer trust. Contact the company for custom work and professional, efficient technical/product support. Image captions: left to right, rectangular and annular spots; left to right, text-pattern spot and square cross alignment spot.
Overview
Specifications
| Parameter | Value |
|---|---|
| Design Wavelength | 193 nm UV to 10.6 μm Infrared |
| Input Beam Specifications - Input Beam Type | Collimated Gaussian Beam/Flat-Top Beam |
| Input Beam Specifications - Incidence Method | Normal Incidence/Oblique Incidence |
| Substrate Material | Fused Silica, Silicon, Germanium, Zinc Selenide |
Applications
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