Flat-Top Beam Generator
Beam shapers, also called beam converters, control optical fields. Phase modulation, amplitude control, or geometric optical-path transformations redistribute laser intensity and wavefront phase, changing spot geometry into a target profile for processing, illumination, or inspection. A flat-top beam generator is a typical beam shaper. Definition: optical elements redistribute the incident wavefront and energy to produce a flat-top spot at a specified target plane. Uniform working-area intensity, clear boundaries, and consistent irradiation energy make this a common laser beam-conversion method. The schematic below shows, from left to right, square and rectangular flat-top spots with their corresponding phases at lower left, then circular and annular flat-top spots with corresponding phases at lower left. Key parameters: 2. Input specifications: (1) collimated input beam; (2) input spot diameter; (3) normal incidence. 3. Working distance, the nominal distance for a sharply imaged target pattern. 4. Diffraction efficiency: 2-level binary phase, 60%–75%; 4-level phase, 80%–88%; 8-/16-level phase, at least 92%. More levels produce cleaner outlines and less stray light. Working principle: phase modulation and subsequent free-space diffraction/interference redistribute optical energy into a uniform flat-top field. Discrete multilevel surface-relief microstructures generate stable controlled phase delays at different positions. Crucially, the shaping plate alone does not directly output a flat-top spot: propagation over a distance, or a focusing lens, is required for sub-waves to interfere and superpose into the desired target-plane field. Customization/manufacturing: the company describes itself as an early Chinese optical-design/manufacturing enterprise with over twenty years in the industry, a professional team, and mature engineering experience. Its in-house micro/nanofabrication platform uses lithography/dry etching to independently make precise multilevel phase structures with consistent surface replication. These convert incident light into sharp-edged, highly uniform flat-top spots with high conversion accuracy and light utilization. Fused silica, silicon, germanium, and ZnSe support UV, visible, through far-IR laser applications. Custom band-specific antireflection coatings combine high laser-damage thresholds with resistance to high/low temperatures and aging. The company controls simulation, structural customization, prototypes, mass production, and inspection, serving small research orders and large industrial supply. Shorter lead times and faster optical setup support address beam shaping, homogenization, and precision irradiation needs. Precise microstructures, stable shaping performance, and environmental adaptability are presented as a recommended high-quality Chinese-made diffractive micro-optical solution. Applications include precision laser processing, annealing, thin-film ablation, lithographic exposure, drilling, surface modification, wafer/photovoltaic-film treatment, and uniform research illumination, with broad customer recognition. Contact the company for custom manufacturing and professional, efficient technical/product support. Image captions: flat-top generator working-principle schematic; product photograph; output-result image.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Design Wavelength | 193 nm UV to 10.6 μm Infrared |
| Input Beam Specifications - Input Beam Type | Collimated Beam |
| Input Beam Specifications - Incidence Method | Normal Incidence |
| Substrate Material | Fused Silica, Silicon, Germanium, Zinc Selenide |
Applications
Datasheet
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Supplier Information
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