SPM3 Nanopositioning Stage

SPM3 Nanopositioning Stage

Supplier
Nano-stage
Part Number
SPM3
Category
Positioner
Origin
China

SPM3 is a three-axis ultrafast nanopositioner with 75µm X/Y travel and natural frequencies above 2kHz on both axes. SPM3's Z section offers 50µm travel and market-leading speed, with maximum natural frequency 12.5kHz. With high-power controllers, SPM3.5 achieves Z step responses below one millisecond. SPM stages suit demanding AFM metrology and combine with coarse microstages; see hybrid systems. Part of our high-speed line, with high-power controllers available.

Specification Snapshot
Repeatability [XY configuration;source column SPM3.30.xx]
0.06 nm
Repeatability [XY configuration;source column SPM3.50.xx]
0.1 nm
Repeatability [XY configuration;source column SPM3.75.xx]
0.15 nm
Repeatability [Z configuration;source column SPM3.xx.05]
0.01 nm
Resonant frequency [Z configuration;source column SPM3.xx.05]
12500 Hz
Repeatability [Z configuration;source column SPM3.xx.10]
0.02 nm
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Overview

SPM3 is a three-axis ultrafast nanopositioner with 75µm X/Y travel and natural frequencies above 2kHz on both axes. SPM3's Z section offers 50µm travel and market-leading speed, with maximum natural frequency 12.5kHz. With high-power controllers, SPM3.5 achieves Z step responses below one millisecond. SPM stages suit demanding AFM metrology and combine with coarse microstages; see hybrid systems. Part of our high-speed line, with high-power controllers available.

Specifications

ParameterValue
Range of motion [XY configuration;source column SPM3.30.xx]30 µm
Resolution [XY configuration;source column SPM3.30.xx]0.03 nm
Noise floor [XY configuration;source column SPM3.30.xx]typical:0.003 nm
Repeatability [XY configuration;source column SPM3.30.xx]0.06 nm
Linearization [XY configuration;source column SPM3.30.xx]typical:0.02%
Resonant frequency XY [XY configuration;source column SPM3.30.xx]3000/2000
Stiffness XY [XY configuration;source column SPM3.30.xx]4/3
Range of motion [XY configuration;source column SPM3.50.xx]50 µm
Resolution [XY configuration;source column SPM3.50.xx]0.05 nm
Noise floor [XY configuration;source column SPM3.50.xx]typical:0.005 nm
Repeatability [XY configuration;source column SPM3.50.xx]0.1 nm
Linearization [XY configuration;source column SPM3.50.xx]typical:0.02%
Resonant frequency XY [XY configuration;source column SPM3.50.xx]3000/2000
Stiffness XY [XY configuration;source column SPM3.50.xx]4/3
Range of motion [XY configuration;source column SPM3.75.xx]75 µm
Resolution [XY configuration;source column SPM3.75.xx]0.075 nm
Noise floor [XY configuration;source column SPM3.75.xx]typical:0.0075 nm
Repeatability [XY configuration;source column SPM3.75.xx]0.15 nm
Linearization [XY configuration;source column SPM3.75.xx]typical:0.02%
Resonant frequency XY [XY configuration;source column SPM3.75.xx]3000/2000
Stiffness XY [XY configuration;source column SPM3.75.xx]4/3
Size W x L x H [XY configuration]121 x 121 x (depends on Z axis range of motion)
Range of motion [Z configuration;source column SPM3.xx.05]5 µm
Resolution [Z configuration;source column SPM3.xx.05]0.005 nm
Typical noise floor [Z configuration;source column SPM3.xx.05]0.0005 nm
Repeatability [Z configuration;source column SPM3.xx.05]0.01 nm
Linearization [Z configuration;source column SPM3.xx.05]typical:0.02%
Resonant frequency [Z configuration;source column SPM3.xx.05]12500 Hz
Stiffness [Z configuration;source column SPM3.xx.05]40 N/µm
Size W x L x H [Z configuration;source column SPM3.xx.05]121 x 121 x 33.7
Range of motion [Z configuration;source column SPM3.xx.10]10 µm
Resolution [Z configuration;source column SPM3.xx.10]0.01 nm
Typical noise floor [Z configuration;source column SPM3.xx.10]0.001 nm
Repeatability [Z configuration;source column SPM3.xx.10]0.02 nm
Linearization [Z configuration;source column SPM3.xx.10]typical:0.02%
Resonant frequency [Z configuration;source column SPM3.xx.10]5500 Hz
Stiffness [Z configuration;source column SPM3.xx.10]7.5 N/µm
Size W x L x H [Z configuration;source column SPM3.xx.10]121 x 121 x 49.7
Range of motion [Z configuration;source column SPM3.xx.25]25 µm
Resolution [Z configuration;source column SPM3.xx.25]0.025 nm
Typical noise floor [Z configuration;source column SPM3.xx.25]0.0025 nm
Repeatability [Z configuration;source column SPM3.xx.25]0.05 nm
Linearization [Z configuration;source column SPM3.xx.25]typical:0.02%
Resonant frequency [Z configuration;source column SPM3.xx.25]5500 Hz
Stiffness [Z configuration;source column SPM3.xx.25]7.5 N/µm
Size W x L x H [Z configuration;source column SPM3.xx.25]121 x 121 x 49.7
Range of motion [Z configuration;source column SPM3.xx.50]50 µm
Resolution [Z configuration;source column SPM3.xx.50]0.05 nm
Typical noise floor [Z configuration;source column SPM3.xx.50]0.005 nm
Repeatability [Z configuration;source column SPM3.xx.50]0.1 nm
Linearization [Z configuration;source column SPM3.xx.50]typical:0.02%
Resonant frequency [Z configuration;source column SPM3.xx.50]3500 Hz
Stiffness [Z configuration;source column SPM3.xx.50]2.7 N/µm
Size W x L x H [Z configuration;source column SPM3.xx.50]121 x 121 x 69.7
Sensor [General specifications]Silicon HR Sensor
Material [General specifications]Aluminium
Cable length [General specifications]2 m
Controller [General specifications]High Speed
Maximum load* [Horizontal use;General specifications]0.1 kg
Maximum load* [Vertical use;General specifications]0.01 kg

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Supplier Information

Na
Nano-stage
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Beijing Naz Precision Technology Co., Ltd. was established in 2018, located in Haidian District, Beijing. The company is dedicated to precision positioning equipment, providing piezoelectric ceramic nano positioning stages, large stroke nano positioning stages, air bearing rotary tables, multi-axis stages, laser interferometers, etc., widely applied in metrology, microscopy, life sciences, laser technology, and semiconductor fields. It is the authorized dealer of German Smaract in China, and independently develops linear motors and air bearing stages. Its AFM ultra-thin ultra-stable linear stage is unique in China, and high-precision air bearing platforms provide domestic high-performance displacement stages for semiconductor inspection.

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