Low-hydroxyl synthetic quartz F-HIR

Low-hydroxyl synthetic quartz F-HIR

Supplier
Feilihua
Category
Optical Material
Origin
China

F-HIR is a highly preferred material for high-power lasers, DUV optical systems, lighting, measurement equipment, and KrF/ArF photomask substrates.

Specification Snapshot
Refractive Index [Wavelength λ=194.17nm]
1.559068
Refractive Index n_{krf} [Wavelength λ=248.27nm]
1.508583
Refractive Index [Wavelength λ=302.15nm]
1.487348
Refractive Index [Wavelength λ=313.18nm]
1.484501
Refractive Index [Wavelength λ=351nm]
1.476868
Refractive Index n_{i} [Wavelength λ=365.01nm]
1.474688
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Overview

F-HIR is a highly preferred material for high-power lasers, DUV optical systems, lighting, measurement equipment, and KrF/ArF photomask substrates.

Specifications

ParameterValue
Total metal impurity content [F-HIR material overview (not separated by grade)]<10
Hydroxyl Content [F-HIR material overview (not separated by grade)]<1
Temperature rise [F-HIR material overview (not separated by grade); 10000W, 150S]<5
Internal Transmittance [F-HIR material overview (not separated by grade); 10mm; 193nm]99.7%
Internal Transmittance [F-HIR material overview (not separated by grade); 10mm; 248nm]99.8%
Internal Transmittance [F-HIR material overview (not separated by grade); 10mm; 633nm]99.9%
External transmittance [F-HIR material overview (not separated by grade); 6.35mm; 193nm]≥90.2%
Weak absorption [F-HIR material overview (not separated by grade); 1064nm]<2
Coefficient of Thermal Expansion [F-HIR material overview (not separated by grade); 30~200℃]<6.5×10⁻⁷
Radiation resistance / Transmittance change [F-HIR material overview (not separated by grade); Irradiation 100kJ/cm²]<0.5
Uniformity [Optical homogeneity sample; Glass aperture Φ100mm]0.19 ×10⁻⁶
Uniformity [Optical homogeneity sample; Glass aperture Φ150mm]0.44 ×10⁻⁶
Uniformity [Optical homogeneity sample; Glass aperture Φ200mm]0.51 ×10⁻⁶
Uniformity [Optical homogeneity sample; Glass aperture Φ250mm]0.89 ×10⁻⁶
Uniformity [Optical homogeneity sample; Glass aperture Φ300mm]1.01 ×10⁻⁶
Uniformity [Optical homogeneity sample; Glass aperture Φ350mm]1.73 ×10⁻⁶
Hydroxyl Content [F-HIR1]< 50
Optical Homogeneity [F-HIR1]≤ 0.5 ×10⁻⁶
Stress [F-HIR1]≤ 5 nm/cm
Striae [F-HIR1; Three-dimensional light-transmission directions, ISO-10110 class5]3D
Fluorescence [F-HIR1; Mercury lamp 254nm/365nm inspection]None
Hydrogen Concentration [F-HIR1; Customizable]5×10¹⁶ ~ 5×10¹⁸
Hydroxyl Content [F-HIR2]< 50
Optical Homogeneity [F-HIR2]≤ 1 ×10⁻⁶
Stress [F-HIR2]≤ 5 nm/cm
Striae [F-HIR2; Three-dimensional light-transmission directions, ISO-10110 class5]3D
Fluorescence [F-HIR2; Mercury lamp 254nm/365nm inspection]None
Hydrogen Concentration [F-HIR2; Customizable]5×10¹⁶ ~ 5×10¹⁸
Hydroxyl Content [F-HIR3]< 50
Optical Homogeneity [F-HIR3]≤ 2 ×10⁻⁶
Stress [F-HIR3]≤ 5 nm/cm
Striae [F-HIR3; Three-dimensional light-transmission directions, ISO-10110 class5]3D
Fluorescence [F-HIR3; Mercury lamp 254nm/365nm inspection]None
Hydrogen Concentration [F-HIR3; Customizable]5×10¹⁶ ~ 5×10¹⁸
Hydroxyl Content [F-HIR4]< 50
Optical Homogeneity [F-HIR4]≤ 3 ×10⁻⁶
Stress [F-HIR4]≤ 5 nm/cm
Striae [F-HIR4; Three-dimensional light-transmission directions, ISO-10110 class5]3D
Fluorescence [F-HIR4; Mercury lamp 254nm/365nm inspection]None
Hydrogen Concentration [F-HIR4; Customizable]5×10¹⁶ ~ 5×10¹⁸
Hydroxyl Content [F-HIR5]< 50
Optical Homogeneity [F-HIR5]≤ 5 ×10⁻⁶
Stress [F-HIR5]≤ 5 nm/cm
Striae [F-HIR5; Three-dimensional light-transmission directions, ISO-10110 class5]3D
Fluorescence [F-HIR5; Mercury lamp 254nm/365nm inspection]None
Hydrogen Concentration [F-HIR5; Customizable]5×10¹⁶ ~ 5×10¹⁸
Hydroxyl Content [F-HIR6]< 50
Optical Homogeneity [F-HIR6]No Requirement
Stress [F-HIR6]≤ 5 nm/cm
Striae [F-HIR6; Three-dimensional light-transmission directions, ISO-10110 class5]3D
Fluorescence [F-HIR6; Mercury lamp 254nm/365nm inspection]None
Hydrogen Concentration [F-HIR6; Customizable]5×10¹⁶ ~ 5×10¹⁸
Hydroxyl Content [F-HIR7]< 50
Optical Homogeneity [F-HIR7]No Requirement
Stress [F-HIR7]No Requirement
Striae [F-HIR7; Three-dimensional light-transmission directions, ISO-10110 class5]3D
Fluorescence [F-HIR7; Mercury lamp 254nm/365nm inspection]None
Hydrogen Concentration [F-HIR7; Customizable]5×10¹⁶ ~ 5×10¹⁸
Total bubble cross-sectional area [Grade 1]None
Maximum bubble diameter [Grade 1; Source does not state a unit]None
Total bubble cross-sectional area [Grade 2]≤ 0.002 mm²/100 cm³
Maximum bubble diameter [Grade 2; Source does not state a unit]≤ 0.03
Total bubble cross-sectional area [Grade 3]≤ 0.01 mm²/100 cm³
Maximum bubble diameter [Grade 3; Source does not state a unit]≤ 0.063
Total bubble cross-sectional area [Grade 4]≤ 0.03 mm²/100 cm³
Maximum bubble diameter [Grade 4; Source does not state a unit]≤ 0.1
Refractive Index [Wavelength λ=194.17nm]1.559068
Refractive Index n_{krf} [Wavelength λ=248.27nm]1.508583
Refractive Index [Wavelength λ=302.15nm]1.487348
Refractive Index [Wavelength λ=313.18nm]1.484501
Refractive Index [Wavelength λ=351nm]1.476868
Refractive Index n_{i} [Wavelength λ=365.01nm]1.474688
Refractive Index n_{h} [Wavelength λ=404.65nm]1.469771
Refractive Index n_{F'} [Wavelength λ=479.99nm]1.463658
Refractive Index n_{d} [Wavelength λ=587.56nm]1.458620
Refractive Index n_{D} [Wavelength λ=589.29nm]1.458562
Refractive Index n_{He-Ne} [Wavelength λ=632.8nm]1.457176
Refractive Index n_{c'} [Wavelength λ=643.84nm]1.456863
Refractive Index n_{r} [Wavelength λ=706.51nm]1.455305
Refractive Index n_{s} [Wavelength λ=852.11nm]1.452628
Refractive Index n_{t} [Wavelength λ=1013.98nm]1.450411
Refractive Index [Wavelength λ=1529.58nm]1.444438

Applications

F-HIR is a highly preferred material for high-power lasers, DUV optical systems, lighting, measurement equipment, and KrF/ArF photomask substrates.

Key Features

Striae meet ISO-10110 class5 in all three transmission directions; fluorescence inspected with mercury lamps at 254 nm/365 nm; customizable hydrogen concentration, retaining the grade table's mol/cm³ units.

Datasheet

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Supplier Information

Fe
Feilihua
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Hubei Feilihua Quartz Glass Co., Ltd. is located in Jingzhou City, Hubei Province, a famous historical and cultural city in China. The company is mainly engaged in the research and development and production of high-performance quartz glass, quartz fiber and composite materials, mainly serving high-tech fields such as semiconductors, optical communications, photovoltaic solar energy, high-end optics and aerospace. It is the first quartz material supplier in China to pass the integrated circuit chip access qualification certification, and one of the few companies in the world with mass production capacity of quartz fiber. The company was founded in 1966 and listed on the ChiNext Board of the Shenzhen Stock Exchange in 2014. It is the first listed company in China's quartz industry (stock code 300395). It now has seven production bases in Jingzhou, Qianjiang, Wuhan, Shanghai, Hefei, Taizhou, and Jinan, as well as three major R&D platforms in Jingzhou, Wuhan, and Shanghai. The company has passed ISO9001, ISO14001 and ISO45001 system certifications. It is now a national enterprise technology center, a special optical glass material technology innovation center, a national high-tech enterprise, a Hubei provincial enterprise technology center, a Hubei provincial high-performance quartz glass and quartz fiber engineering technology research center, a Hubei provincial postdoctoral industry base, the fifth batch of innovative pilot enterprises in China, and a Hubei provincial key laboratory of advanced optical quartz material technology. The company adheres to the core values of "Focus, Integrity, Innovation, Enterprising" and is committed to providing global customers with overall solutions for high-performance quartz products, becoming a leader in quartz technology innovation.

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Low-hydroxyl synthetic quartz F-HIR
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