Ion Beam Sputtering Coating System (IBS)
This equipment combines a sputtering ion source, auxiliary ion source, and multiple target materials with RF ion-beam sputtering. Crystal or optical thickness monitoring controls batch production of high-precision multilayer optical components. Applications include volume production of optical-communications filters (Lan-WDM, MWDM, DWDM100G), semiconductor chips, UV coatings, and high-laser-damage-threshold coatings.
Request a Quote
Download Datasheet
Overview
This equipment combines a sputtering ion source, auxiliary ion source, and multiple target materials with RF ion-beam sputtering. Crystal or optical thickness monitoring controls batch production of high-precision multilayer optical components. Applications include volume production of optical-communications filters (Lan-WDM, MWDM, DWDM100G), semiconductor chips, UV coatings, and high-laser-damage-threshold coatings.
Specifications
| Parameter | Value |
|---|---|
| Target mechanism | Interchangeable from two to four targets |
| Target mechanism - Left/right movement | 25mm |
| Target mechanism - Target rotation accuracy | <0.1° |
| Crystal film-thickness monitoring system - Correction-plate rotation accuracy | <0.1° |
| Substrate mechanism - Workpiece rotational speed [1x12 inches (single-disc high-speed transmission structure)] | 10~1000rpm |
| Substrate mechanism - Workpiece rotational speed [4x8 inches (planetary gear transmission structure)] | 0~30rpm |
| Optical monitoring system OMS | Dual-path laser optical monitoring / white-light optical monitoring |
| Vacuum Chamber Dimensions-Diameter | 1040mm |
| Vacuum Chamber Dimensions-Height | 890mm |
| Ultimate Vacuum | Below 4.0E-5Pa |
| Gas-leak rate [Helium leak rate] | ≤5E-9Pa·m3/s (helium leak rate) |
| Gas-leak rate - Pressure holding [12 hours] | ≤5Pa |
| Vacuum recovery [Within 40 minutes; No heating] | Reaches 1.1E-3Pa within 40 minutes (without heating) |
| Main ion source | RF ion source, 16cm, three-focus converging ion beam |
| Auxiliary ion source | RF ion source, 8cm or 12cm, three-sheet diverging ion beam (literal source wording) |
| Sputtering-target system - Left/right adjustment | ±25mm |
| Sputtering-target system - Configurable | 2-4 targets |
| Sputtering-target system - Dimensions | 14cun |
| Installation site - Width | 2500 mm |
| Installation site - Depth | 3000 mm |
| Installation site - Height | 2850mm |
| Installation site - Floor load capacity [Per square meter] | More than 800 kilograms per square meter |
Datasheet
Please provide your email to download the datasheet.
Your name
Email Address
Invalid email format. Please try again.
Send Request
Supplier Information
Jelight (Suzhou) Precision Instrument Co., Ltd. was established in August 2013 and is a high-tech enterprise specializing in the research and development, production, and sales of precision thin film deposition equipment.
Currently, the company has R&D centers in Milpitas, USA and Suzhou Industrial Park, Jiangsu; a 15,000-square-meter production base in Zhangjiagang, Jiangsu; and sales and after-sales service centers in Xi'an, Beijing, and other places. Adhering to the mission of "developing high-end coating technology and building a first-class coating equipment enterprise," the company is fully committed to optimizing process control and fine management, advocating the business philosophy of "honesty as the foundation, credibility as the career," and striving to forge a brilliant future for the enterprise.
The company possesses world-advanced vacuum coating technology and has applied for multiple patents. Product types include ion beam sputtering coating machines (IBS), magnetron sputtering coating machines, electron beam/resistance evaporation coating machines, and multifunctional thin film deposition systems (In-Line, Cluster), etc., while also undertaking coating process consulting services and other businesses. The coating machines produced by the company not only have stable performance but also feature outstanding advantages such as multi-point synchronous precision optical monitoring systems and real-time film thickness distribution control, which can meet the equipment needs of various coating demand markets. Among them, ion sputtering coating machines and magnetron sputtering coating machines are particularly suitable for making various high-difficulty optical thin film products.
The company will fully leverage its own technological advantages, always adhere to the quality philosophy of "rigorous and focused, striving for perfection," and sincerely create product value for customers. We welcome inquiries from all walks of life!
Contact Us
Loading...
GetExperimental Plan
Name
Phone
+86
Organization
Use Case

Global Photonics Products
Database Platform
Database Platform
With 16 years of experience, we provide high-quality products and services to universities, research institutes, and industry.
50+ Detailed Categories · 3,000+ Global Brands · 100,000+ Photonics Products
1 Million+
In-depth analysis of professional academic resources in photonics
300,000
ProductsDatasheets Available Free
We will keep your personal information strictly confidential.
Product Quote
+86
* Select the quoting party:
By submitting, you agree to the User Service Agreement and Privacy Policy