Magnetron Sputtering Coating System
This equipment uses DC-pulsed, medium-frequency magnetron sputtering, and RF magnetron sputtering with metal targets such as tantalum, niobium, and aluminum, or semiconductor targets such as silicon. A high-performance PAS ion source enables reactive oxide and nitride deposition. Main applications include batch production of biomedical fluorescence filters and optical-communications filters such as DWDM100G.
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Overview
This equipment uses DC-pulsed, medium-frequency magnetron sputtering, and RF magnetron sputtering with metal targets such as tantalum, niobium, and aluminum, or semiconductor targets such as silicon. A high-performance PAS ion source enables reactive oxide and nitride deposition. Main applications include batch production of biomedical fluorescence filters and optical-communications filters such as DWDM100G.
Specifications
| Parameter | Value |
|---|---|
| DWDM100G parameters - Central wavelength | ITU Grid |
| DWDM100G parameters - Passband bandwidth | >=0.42 nm |
| DWDM100G parameters - Peak insertion loss | <=0.25 dB |
| DWDM100G parameters - Passband insertion loss | <=0.5 dB |
| DWDM100G parameters - Passband ripple | <=0.25 dB |
| DWDM100G parameters - Stopband bandwidth | <=1.18 nm |
| DWDM100G parameters - Reflection isolation @ passband [@ Passband] | >=13.5 dB |
| DWDM100G parameters - Stopband bandwidth isolation | >=30 dB |
| DWDM100G parameters - Thermal wavelength drift | <1 pm/℃ |
| DWDM100G parameters - Incidence angle (AOI) | 1.8 degree |
| DWDM100G parameters - Polarization-dependent loss (PDL) | <=0.05 dB |
| DWDM100G parameters - Polarization mode dispersion (PMD) | <=0.1 PS |
| DWDM100G parameters - Ar reflectance | <=0.2 % |
| DWDM100G parameters - Substrate material | Customer Specified |
| DWDM100G parameters - Dimensions | 1.4*1.4*1.0 (or Customer Specified) |
| DWDM100G parameters - Scratch/dig | 40/20 |
| DWDM100G parameters - Wedge angle between two surfaces | Customer Specified |
| DWDM100G parameters - Operating temperature | −20~70 ℃ |
| DWDM100G parameters - Storage temperature | −40~85 ℃ |
| Vacuum Chamber Dimensions | 965.4mmx1117.6mmx685.8mm |
| Ultimate Vacuum | Below 4E-5Pa |
| Gas-leak rate [Helium leak rate] | ≤5E-9Pa·m3/s (helium leak rate) |
| Gas-leak rate - Pressure holding [12 hours] | ≤5Pa |
| Vacuum recovery [Within 100 minutes; No heating] | Reaches 3E-4Pa within 100 minutes (without heating) |
| Substrate rotation mechanism - Rotational-speed adjustment range [Center drive] | 0-1000rpm |
| Substrate-disc dimensions [Choose one of two] | 150mm or 304mm (choose one) |
| Optical-control system | GILITEK transmission optical control system (laser or white light optional, arbitrary film-thickness monitoring) |
| Cathode target [Choose one of two] | ①8-inch target*2+6-inch target*1+RF radio-frequency source; ②8-inch target 4 dual-target co-sputtering (choose one of the two; grouping retained as written) |
Datasheet
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Supplier Information
Jelight (Suzhou) Precision Instrument Co., Ltd. was established in August 2013 and is a high-tech enterprise specializing in the research and development, production, and sales of precision thin film deposition equipment.
Currently, the company has R&D centers in Milpitas, USA and Suzhou Industrial Park, Jiangsu; a 15,000-square-meter production base in Zhangjiagang, Jiangsu; and sales and after-sales service centers in Xi'an, Beijing, and other places. Adhering to the mission of "developing high-end coating technology and building a first-class coating equipment enterprise," the company is fully committed to optimizing process control and fine management, advocating the business philosophy of "honesty as the foundation, credibility as the career," and striving to forge a brilliant future for the enterprise.
The company possesses world-advanced vacuum coating technology and has applied for multiple patents. Product types include ion beam sputtering coating machines (IBS), magnetron sputtering coating machines, electron beam/resistance evaporation coating machines, and multifunctional thin film deposition systems (In-Line, Cluster), etc., while also undertaking coating process consulting services and other businesses. The coating machines produced by the company not only have stable performance but also feature outstanding advantages such as multi-point synchronous precision optical monitoring systems and real-time film thickness distribution control, which can meet the equipment needs of various coating demand markets. Among them, ion sputtering coating machines and magnetron sputtering coating machines are particularly suitable for making various high-difficulty optical thin film products.
The company will fully leverage its own technological advantages, always adhere to the quality philosophy of "rigorous and focused, striving for perfection," and sincerely create product value for customers. We welcome inquiries from all walks of life!
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