Magnetron Sputtering Coating System (Research Model)
An integrated design combines the main unit and control system and permits glovebox integration. Selectable substrate sizes include 100*100mm, 150*150mm, 210*210mm, and 8 inches with compatibility for smaller sizes. It deposits metals such as titanium, nickel, and silver and oxides such as silicon oxide and aluminum oxide.
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Overview
An integrated design combines the main unit and control system and permits glovebox integration. Selectable substrate sizes include 100*100mm, 150*150mm, 210*210mm, and 8 inches with compatibility for smaller sizes. It deposits metals such as titanium, nickel, and silver and oxides such as silicon oxide and aluminum oxide.
Specifications
| Parameter | Value |
|---|---|
| Ultimate Vacuum [With the chamber clean and unloaded, after 24 hours of continuous pumping] | 4E-5Pa (clean, unloaded chamber, after 24 hours of continuous pumping) |
| Gas-leak rate [Helium leak rate] | ≤5E-9Pa·m3/s (helium leak rate) |
| Gas-leak rate - Pressure holding [12 hours] | ≤5Pa |
| Pressure-control accuracy [Process pressure range 0.2-2Pa] | 0.1Pa (process pressure range 0.2-2Pa) |
| Film-thickness uniformity [(Maximum value-Minimum value)/(Maximum value+Minimum value)] | ≤5% ((maximum-minimum)/(maximum+minimum)) |
| Cathode source | 2.5-, 3-, 4-, 6-, 8- and 12-inch options, pneumatic cathode shutter and angle adjustment |
| Substrate stage - Maximum loadable substrate | 210mm*210mm |
| Substrate stage | Rotation and lifting; Heating or water cooling (choose one) |
| Vacuum System | Turbomolecular pump + mechanical pump vacuum system with bypass pumping, allowing chamber opening without stopping the main pump (cryopump optional) |
| Control system | PLC + PC or PLC + touchscreen automated operation; One-button evacuation and gas filling. |
| Glovebox [Optional] | (Optional) Connection to coating equipment for substrate loading/unloading in a water- and oxygen-free environment |
| Sample chamber [Optional] | (Optional) Vacuum robot for substrate handling without breaking vacuum in the process chamber |
Datasheet
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Supplier Information
Jelight (Suzhou) Precision Instrument Co., Ltd. was established in August 2013 and is a high-tech enterprise specializing in the research and development, production, and sales of precision thin film deposition equipment.
Currently, the company has R&D centers in Milpitas, USA and Suzhou Industrial Park, Jiangsu; a 15,000-square-meter production base in Zhangjiagang, Jiangsu; and sales and after-sales service centers in Xi'an, Beijing, and other places. Adhering to the mission of "developing high-end coating technology and building a first-class coating equipment enterprise," the company is fully committed to optimizing process control and fine management, advocating the business philosophy of "honesty as the foundation, credibility as the career," and striving to forge a brilliant future for the enterprise.
The company possesses world-advanced vacuum coating technology and has applied for multiple patents. Product types include ion beam sputtering coating machines (IBS), magnetron sputtering coating machines, electron beam/resistance evaporation coating machines, and multifunctional thin film deposition systems (In-Line, Cluster), etc., while also undertaking coating process consulting services and other businesses. The coating machines produced by the company not only have stable performance but also feature outstanding advantages such as multi-point synchronous precision optical monitoring systems and real-time film thickness distribution control, which can meet the equipment needs of various coating demand markets. Among them, ion sputtering coating machines and magnetron sputtering coating machines are particularly suitable for making various high-difficulty optical thin film products.
The company will fully leverage its own technological advantages, always adhere to the quality philosophy of "rigorous and focused, striving for perfection," and sincerely create product value for customers. We welcome inquiries from all walks of life!
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