EBL Grating Definition

EBL Grating Definition

Supplier
Ori-chip
Category
Technical Services
Origin
China
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Key Features

● Using High current direct electron beam writing, gratings can be defined at very fast pace. ● Very accurate pitch control: For 200nm pitch grating, the pitch accuracy is within +/-0.03nm. ● Can write uniform pitch grating, chirped grating and phase-shift gratings. ● With dielectric and InP/InGaAsP etch capability

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Ori-chip
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Founded in 2018, Ori-Chip Optoelectronics Technology Co. Ltd., is dedicated to make the state-of-the-art photonic integrated circuits, including both InP and thin-film lithium niobate platforms. Our main products include: full C-band Widely-tunable lasers,Thin-film lithium niobate MZM modulators,and DFB laser diodes for both fiber optic communication and sensing. Using the cutting-edge InP and thin-film lithium niobate technology, our products deliver the best performance at competitive price. We hold multiple IPs, including patents from both China and the United States. All of our products are made in-house by ORI-CHIP wafer fabs.

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EBL Grating Definition
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