Home All Products Industrial Manufacturing Equipment Semiconductor Manufacturing Equipment Single-Chamber Atomic Energy Deposition (ALD) PA200d
Single-Chamber Atomic Energy Deposition (ALD) PA200d
Semiconductor Manufacturing Equipment

Single-Chamber Atomic Energy Deposition (ALD) PA200d

Supplier
Etelux
Part Number
PA200d
Category
Semiconductor Manufacturing Equipment
Origin
China

Reaction chamber:316L stainless steel with a base machined from solid material; chamber surfaces are polished then electrolytically treated. Dovetail seals use corrosion-resistant rings. Standard8-inch chamber/sample stage diameter200mm. Equipment base vacuum is better than3Pa; leak rate ≤5×10-10Pa·m3/s. Stage heating reaches400oC with PID accuracy±1oC. Automatic gas filling and overpressure protection are provided. Vacuum system: mechanical pumping, using a rotary-vane pump with oil-mist filter and gas ballast,20m³/h, described as dual-substrate, vacuum <2x10⁻³mbar, or an optional dry pump. Power options:AC230V/50-60Hz,10A or AC115V/50-60Hz,20A. Pumps from atmosphere to9×10⁻⁴Pa in≤30min after brief atmospheric exposure and dry-nitrogen filling. A front GDQ-40 high-vacuum pneumatic baffle valve is provided. Imported pressure sensors cover5×10⁻⁴~1000mbar; metal and fluororubber seals are used in different locations. Precursor delivery: simultaneously handles up to5 ALD sources—three organometallic/other metal sources up to150℃ and two oxidant/reductant sources such as water,hydrogen peroxide,oxygen or ammonia. The stated arrangement includes one ambient source,two heated sources,one reserved line and a reserved ozone connection. Heated delivery lines operate over RT-250oC with±1oC control. Lines/fittings are316 EP electropolished stainless steel with metal VCR seals. N2 or Ar carrier gas is controlled by mass-flow controllers. Inert-gas automatic cleaning has a user-set cycle count. Ambient source: three-port ALD valve with response<5ms,manual source valve and50mL stainless bottle. Heated source: three-port ALD valve with response<5ms and a built-in1/8-inch heater,RT-200oC,manual valve;50mL stainless bottle at RT-200oC. Control:windows platform,cotrl1000 controller and IPC+network technology provide parameter settings,real-time monitoring,intelligent fault diagnostics and automatic thickness monitoring,with automatic/manual modes. All operations except sample loading/unloading are PC-software controlled,with interfaces for vacuum,process settings and gas filling/venting. Options:ozone generator,powder-deposition tray,glovebox integration,QCM and exhaust treatment. Listed certifications:ISO9001,CE and UL. One-year warranty,lifetime repair; consult manual danger/warning/caution provisions.

Specification Snapshot
Dimensions
1000mm×700mm×1000mm
Request a Quote Download Datasheet
Save to Favorites Save to Favorites

Overview

Reaction chamber:316L stainless steel with a base machined from solid material; chamber surfaces are polished then electrolytically treated. Dovetail seals use corrosion-resistant rings. Standard8-inch chamber/sample stage diameter200mm. Equipment base vacuum is better than3Pa; leak rate ≤5×10-10Pa·m3/s. Stage heating reaches400oC with PID accuracy±1oC. Automatic gas filling and overpressure protection are provided. Vacuum system: mechanical pumping, using a rotary-vane pump with oil-mist filter and gas ballast,20m³/h, described as dual-substrate, vacuum <2x10⁻³mbar, or an optional dry pump. Power options:AC230V/50-60Hz,10A or AC115V/50-60Hz,20A. Pumps from atmosphere to9×10⁻⁴Pa in≤30min after brief atmospheric exposure and dry-nitrogen filling. A front GDQ-40 high-vacuum pneumatic baffle valve is provided. Imported pressure sensors cover5×10⁻⁴~1000mbar; metal and fluororubber seals are used in different locations. Precursor delivery: simultaneously handles up to5 ALD sources—three organometallic/other metal sources up to150℃ and two oxidant/reductant sources such as water,hydrogen peroxide,oxygen or ammonia. The stated arrangement includes one ambient source,two heated sources,one reserved line and a reserved ozone connection. Heated delivery lines operate over RT-250oC with±1oC control. Lines/fittings are316 EP electropolished stainless steel with metal VCR seals. N2 or Ar carrier gas is controlled by mass-flow controllers. Inert-gas automatic cleaning has a user-set cycle count. Ambient source: three-port ALD valve with response<5ms,manual source valve and50mL stainless bottle. Heated source: three-port ALD valve with response<5ms and a built-in1/8-inch heater,RT-200oC,manual valve;50mL stainless bottle at RT-200oC. Control:windows platform,cotrl1000 controller and IPC+network technology provide parameter settings,real-time monitoring,intelligent fault diagnostics and automatic thickness monitoring,with automatic/manual modes. All operations except sample loading/unloading are PC-software controlled,with interfaces for vacuum,process settings and gas filling/venting. Options:ozone generator,powder-deposition tray,glovebox integration,QCM and exhaust treatment. Listed certifications:ISO9001,CE and UL. One-year warranty,lifetime repair; consult manual danger/warning/caution provisions.

Specifications

ParameterValue
Dimensions1000mm×700mm×1000mm
Vault sizeΦ300mm×150mm
Slipping Specifications4-12 inches single
TemperatureRT-400 oC
Vacuum-reaction cavity-materials316L stainless steel
Vacuum-reaction cavity-floor processingWhole-scale material processing
Vacuum-reaction cavity-surface treatmentElysed after polishing
Vacuum-sealedSeal with a tug and a corrosive seal
Vacuum-sampling table- cavity specificationsStandard 8 inch cavity
Vacuum room - sample table - diameter200 mm
Vacuum room - device background vacuumBetter than 3 Pa
Vacuum room - equipment leakage rate≤ 5×10-10Pa·m3/s
Vacuum room - sample table - maximum heating temperature400 oC
Vacuum room - sample table - temperature controlPID
Vacuum-sampling table-temperature control accuracy±1 oC
Vacuum room - inflating and protectingAutoinflation and overpressurization protection
Vacuum Room - Volume0.03 m³
Vacuum systems - types"Mechanical pumps"
Vacuum systems - vacuum pumps - typeSlipple vacuum pump
Vacuum systems -- spiral vacuum pumps -- attachments [Slipple vacuum pump]Oil Mist Filter
Vacuum system - spiral vacuum pump - air town control [Slipple vacuum pump]Airborne control.
Vacuum systems - spiral vacuum pumps - flow [Slipple vacuum pump]20 m³/h
Vacuum systems - spiral vacuum pumps - structures [Slipple vacuum pump]Double Base
Vacuum system - spiral vacuum pump - vacuum [Slipple vacuum pump]< 2 x 10⁻³ mbar
Vacuum system -- working voltageAC230V/50-60Hz, 10A or AC115V/50-60Hz, 20A (optional)
Vacuum system - air-smoke time [From atmosphere to9×10⁻⁴Pa; pumping starts after brief atmospheric exposure and dry-nitrogen filling]≤30 min
Vacuum systems - valvesEx-GDQ-40 high-real air-barrel valve
Vacuum systems - Vacuum measurements - sensorsImport pressure sensors
Vacuum systems - Vacuum measurements - detection range5×10⁻⁴~1000 mbar
Vacuum systems - sealingPartially metal sealed, partly fluorinated rubber collar sealed
Propulsion delivery system -- number of precursor sources [One at a time.]As many as 5
Propulsive transport system -- metal control source -- configurationThree sources of control for organic metals or other metals
Propulsive transport system - metal control source - maximum temperature [Three sources of control for organic metals or other metals]150 ℃
Pro-propellant delivery system - Oxygen/Restated Source - ConfigurationTwo oxidizers/revertent sources
Pro-exulsor delivery system - Oxygen/Reductor source - Example of mediumWater, double oxygen, oxygen or ammonia, etc.
Propulsive transport system - constant temperature source configuration1st Road
Propulsive delivery system -- heating source configurationRoad 2.
Propulsive transport system -- number of roads reserved1 channels
Propulsive transport system - pre-emption ozone interface1 units
Propulsion delivery system - pipeline route - heating temperature rangeRT-250 oC
Propulsive transport system - pipeline route - control accuracy±1 oC
Propulsive transport system -- pipe and interface -- materials316 EP-grade electrolytic stainless steel-stained materials
Propulsive transport system -- gas pipeline connection -- sealed [All gas pipeline connections]Metal VCR seal
Front-exposure transport system - carrierN2 or Ar gas
Propulsive transport system -- carrier controlMass flow controller
Propulsive transport system -- self-cleaning systemInert gas self-cleaning system
Propulsive transport system - constant source - valve typeThree-hole ALD valves.
Propulsive transport system - constant source - valve - response time＜5 ms
Propulsive transport system - chronic source - source valveManual valve
Propulsive transport system - chronic sources - source bottles - materialsStainless Steel
Propulsive transport system - constant sources - source bottles - volume50 mL
Propulsive transport system - heating source - valve - typeThree-hole ALD valves.
Propulsive transport system - heating source - valve - response time＜5 ms
Propulsive transport system - heating source - valve - inner heater diameter1/8 inches
Pre-exposure transport system - Heating source - Valve - Inline heater temperature rangeRT-200 oC
Propulsive transport system - Heating source - Source valveManual valve
Propulsive transport system - heating source - source bottle - materialStainless Steel
Propulsive transport system - heating source - source bottle - volume50 mL
Propulsive transport system - heating source - source bottle - temperature rangeRT-200 oC
Control system - operating platformwindows
Control System - controllercotrl1000
Control systems - technologyIPC+network
Control system - control modeAutomatically and manually control both modes
Package Dimensions (W×D×H)1000 mm × 720 mm × 700 mm
Weight500 KG

Key Features

Control systems - Features: The system achieves the ability to edit, preserve, read, etc. of formulations; all ALD valves have automatic de-emption and all pipe lines have automatic cleaning; the system has an advanced interface for the self-recomposition of temperature PID parameters, pre-disposal label changes, etc.; the system can show the heating state, the valve switch state, the pressure curve, the plating progress in real time; the system can monitor power gas pressure values, system pressure values, heating state, valve switch state, etc., in real time, and trigger alarms and responses when an anomaly occurs, and alert logs can be viewed.

Datasheet

Please provide your email to download the datasheet.

Your name
Email Address

Invalid email format. Please try again.

Send Request

Supplier Information

Et
Etelux
View Supplier →
Etelux Inert Gas System (Beijing) Co., Ltd. was established in February 1998, introducing and absorbing European and American technologies to develop inert gas protection equipment, used for glove boxes in science and technology education, university research, lithium battery industry, laser industry, etc., filling the history of long-term dependence on imports in China, greatly reducing procurement costs, and deeply trusted by users. We have always adhered to the business philosophy of "customer first, excellence" and the principle of "customer first" to provide quality services to our customers. We bravely shoulder the responsibilities of the times and social missions, provide customers with higher value service experiences, focus on research and development, continuous innovation, and maintain a leading position in the glove box industry. Etelux Inert Gas System (Beijing) Co., Ltd. has a registered capital of 50 million yuan and owns two major production bases covering an area of more than 10,000 square meters. The company produces various products such as biochemical experimental glove boxes, lithium battery glove boxes, glove boxes for special lamp production, solvent filtration systems, solvent purification systems, gas purification systems, etc. They have been adopted by more than 1,000 customers in aerospace, weapons, military, power supply, biochemistry, physics, metallurgy, electronics, materials and other fields. In recent years, more than 5,000 sets of various equipment not only cover various provinces and regions in China, but also cover Europe and the United States. Its service network has covered major cities in China, and has sales and after-sales service institutions in Beijing, Shanghai, Wuhan, and Guangzhou.

Request a Quote

Our team responds within 24–48 hours
Single-Chamber Atomic Energy Deposition (ALD) PA200d
Etelux · Semiconductor Manufacturing Equipment
Direct from Manufacturer
Your inquiry will be sent directly to the manufacturer
Photonics Source Platform
We handles the inquiry on your behalf
Your information is protected and will never be shared without consent.
Datasheet Live Chat
Contact Us

Loading...

GetExperimental Plan

Name

Phone

+86

Organization

Use Case

Global Photonics Products
Database Platform
With 16 years of experience, we provide high-quality products and services to universities, research institutes, and industry.
50+ Detailed Categories · 3,000+ Global Brands · 100,000+ Photonics Products
1 Million+
In-depth analysis of professional academic resources in photonics
300,000
ProductsDatasheets Available Free
We will keep your personal information strictly confidential.

Product Quote

+86
* Select the quoting party:
By submitting, you agree to the User Service Agreement and Privacy Policy
AI Parametric Selection
Smart Match · Precise Recs
Enter Specifications
AI Smart Matching
Get Best Matches
Skip Manual Comparison
Find Best Solutions Fast
Select Now →
China's Leading Optoelectronics Platform