A standing magnetic-control spatter plating machine
This equipment uses vacuum magnetron and medium-frequency sputtering with an advanced control system to deposit So，/ITO films on high-quality float glass in a fully automatic continuous process. Main parts of the vertical magnetron sputtering coater: 1. Vertical stainless-steel vacuum chamber with external cooling water and internal stainless baffles. 2. Worm-wheel molecular-pump vacuum system. 3. DC magnetron and medium-frequency magnetron sputtering targets mounted on opposite chamber sides. 4. Stainless tubular heaters with heat-spreading plates for uniform substrate heating. 5. Gas mass-flow meters and automatic pressure controllers. 6. Touchscreen/PLC electrical control with human-machine data display, operation and control. 7. Water cooling for the chamber and cathodes, with water-pressure protection and flow switches.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Total Power | 350 kw |
| Maximum vacuum pressure | 7X10+ |
| Average production cycle | 100 秒/架 |
| Straight-flow magnetic control target power | 20 kw |
| Medium frequency magnetic control target power | 20 kw |
| Base size | 750×1200（mm） |
Datasheet
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