193 nm Deep UV metal reflection film
The support of integrated circuits has played a crucial role in determining the physical dimensions of individual devices directly. As integration increases, the difficulty of optical carving is growing. To increase resolution, the wavelength of optical exposure machines is shrinking, from 436 nm to 365 nm to 248 nm and 193 nm to deep ultraviolet (DUV). In the 193 nm band, the influence of thin film materials and base absorption, dispersion and impurities makes it difficult to plating thin film elements that are highly optical.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Center Wavelength | 193 nm |
| Peak Reaction Rate | R>92.5% |
| Dimensions | Customise as required by clients |
| Substrate Material | JGS1 |
| Surface Finish | Proms 60-40 |
Datasheet
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