GX900 Precision Optical Plating Membrane Device
The equipment uses electron-beam evaporation. Electrons emitted from a cathode filament are focused into a beam and accelerated by the potential between the cathode and crucible to melt and evaporate coating materials. The high energy density enables evaporation of materials with melting points reaching 3000 degrees Celsius and above, providing high film purity and thermal efficiency. The equipment includes an electron-beam evaporation source, ion source, film-thickness monitoring system, film-thickness correction mechanism and stable umbrella-shaped workpiece rotation system. Ion-assisted coating increases film density, stabilizes refractive index and avoids moisture-induced wavelength shifts. Fully automatic real-time film-thickness monitoring supports process repeatability and stability. A built-in automatic material-melting function reduces dependence on operator skill. The equipment is suitable for various oxide and metal coating materials and can deposit multilayer precision optical films, including AR, long-pass, short-pass, brightness-enhancement, AS/AF, IRCUT, colored and gradient film systems. Applications include AR spectacle lenses, optical lenses, cameras, optical elements, optical filters and the semiconductor industry.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Internal size | φ900*H1050(mm) |
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