Single-Sided Polishing Machine TAP-600 Dual
This high-precision single-side polisher has two polishing platens and supports simultaneous four-axis processing. Polishing heads can be configured for different wafers. Vacuum suction holds the wafer, an airbag applies pressure, and the polishing head rotates and oscillates. Suitable for polishing different semiconductor materials, with capacity up to 8-inch wafers. Two platens and 4 polishing heads can operate simultaneously. Cleaning includes immersion ultrasonic cleaning and reverse water-flush self-cleaning of the heads.
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Overview
This high-precision single-side polisher has two polishing platens and supports simultaneous four-axis processing. Polishing heads can be configured for different wafers. Vacuum suction holds the wafer, an airbag applies pressure, and the polishing head rotates and oscillates. Suitable for polishing different semiconductor materials, with capacity up to 8-inch wafers. Two platens and 4 polishing heads can operate simultaneously. Cleaning includes immersion ultrasonic cleaning and reverse water-flush self-cleaning of the heads.
Specifications
| Parameter | Value |
|---|---|
| Wafer Size | 8 in |
| Disk Disk Specification | OD630 mm |
| Number of CDs dropped | 2 units |
| Number of heads polished | 4 units |
Datasheet
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Supplier Information
Beijing TSD Semiconductor Equipment Co., Ltd. is a national high-tech enterprise with independent intellectual property rights, focusing on the R&D, production, and sales of ultra-precision planar processing equipment for the semiconductor field. With the mission of "leading semiconductor technology progress and assisting customer development", it is committed to becoming a globally leading semiconductor equipment manufacturer.
Guided by the technology orientation of "flatter, thinner, more reliable", TSD deeply cultivates ultra-precision planar processing technology in fields such as semiconductor substrate materials, wafer manufacturing, semiconductor devices, advanced packaging, and MEMS, forming core technical advantages of leading technology, superior performance, and stable processes, and can provide systematic solutions and process equipment for thinning, polishing, and CMP.
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