Continuous Dual-Chamber Magnetron Sputtering Optical Coating Machine
This continuous dual-chamber magnetron-sputtering optical coating system is used for optical coatings, ultrahard AR films on 3D automotive center-control screens and high-definition mobile-phone camera lenses, and NCVM colored films on phone back covers. The equipment is described as comprising three main parts. The front process chamber handles substrate loading/unloading and pretreatment, while the sputtering chamber continuously maintains high vacuum for a consistent coating environment. Substrate carrier plates are transferred between the two chambers. The sputtering chamber has 4 pairs of target positions for identical or different target materials. Each pair can operate independently or simultaneously to meet different film-stack designs, and the structure simplifies target replacement. The chamber has an advanced RF CCR post-oxidation function that increases deposition speed and produces ultrahard, more scratch-resistant films. Other gases can also be introduced for harder specialty coatings. Front process chamber: 1. Ion-source cleaning removes substrate surface oil and improves adhesion. 2. Two target positions deposit metal films while reducing contamination of the coating chamber. 3. Heated AF tablets provide anti-fingerprint coatings with high utilization, low cost and improved results. 4. A double-door structure supports seamless continuous production and shortens the coating cycle. Sputtering chamber: 1. A design with 4 pairs (8 positions) enables continuous multilayer coating with different materials. 2. Advanced German CCR post-oxidation improves film quality. 3. Mechanical carrier-plate transfer avoids contamination in vacuum and accelerates the coating cycle. 4. An opening-door arrangement at the end facilitates maintenance and servicing during use.
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