Magnetron Sputtering Optical Coating Machine
Uses magnetron sputtering to produce cut filters, bandpass filters, RGB filters, AR films, hard AR films, HR films, AS/AF films, AR+DLC+AS/AF films, ITO films and infrared AR films. Core technology: stable reactive sputtering deposition. The company's distinctive target tube structure, multisection gas flow control and constant-pressure gas control enable stable control of the magnetron sputtering rate. Online real-time thickness monitoring ensures film uniformity and product consistency, providing uniform reactive films and consistent colors with different gases. Equipment configuration: vacuum chamber sizes: VSD 1621 (1600*2100), VSD 1821 (1800*2100) and VSD 2527 (2500*2700). Vacuum system: an ultralow-temperature refrigeration unit reaching below -135°, mechanical pump (RP), Roots pump (MBP) and molecular pump (TMP). Process power supply: medium-frequency power supply. Control system: imported programmable controller and touchscreen.
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