Excimer Laser Annealing Systems ELA-248-50
The excimer laser annealing system uses an excimer laser as its light source. Homogenization and beam shaping produce an extremely uniform, high-energy-density line beam for uniform scanning of large-area samples. The system has a short output wavelength, high photon energy, and a shallow absorption depth in the sample. It is mainly used in annealing or modification research for thin-film materials, including low-temperature polysilicon film annealing and development of optoelectronic functional thin films.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Laser Wavelength | 248nm |
| Laser Beam Size | 50mm×0.8mm |
| Maximum Laser Energy Density | 200 mJ/cm² |
| Beam Uniformity | >92% |
| Scan Step Accuracy | 5μm |
| Processing Atmosphere | N2/Air |
| Weight | 500Kg |
| Cooling Method | Air |
| External Form (L×W×H) | 1800mm×900mm×1600mm |
Key Features
Datasheet
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