Silicon Longpass Filters PSiWA8002

Silicon Longpass Filters PSiWA8002

Supplier
Umoptics
Part Number
PSiWA8002
Category
Optical Filters
Origin
China

Silicon long wave pass filters are optical devices based on silicon-based materials, and the optical properties of silicon substrates are closely related to their preparation methods. Silicon long wave pass filters have good transmittance in the 1-8 μ m wavelength range, typically composed of multiple layers of reflective film and silicon substrate. The design of these film layers allows only light with a wavelength greater than a certain set value to pass through the filter, while shorter wavelength light is reflected or absorbed. In the 1-8 μ m wavelength range, it has a high transmittance, which is the main operating band of silicon long wave pass filters. In the 8-14 μ m wavelength range, the transmittance begins to decrease due to the absorption of oxygen elements. In the field of optics, silicon long wave pass filters are applied in the manufacturing of special optical glass, fiber optic amplifiers, laser crystals, and infrared detectors.

Specification Snapshot
Diameter
8 inch
Thickness
275-1000 μm
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Overview

Silicon long wave pass filters are optical devices based on silicon-based materials, and the optical properties of silicon substrates are closely related to their preparation methods. Silicon long wave pass filters have good transmittance in the 1-8 μ m wavelength range, typically composed of multiple layers of reflective film and silicon substrate. The design of these film layers allows only light with a wavelength greater than a certain set value to pass through the filter, while shorter wavelength light is reflected or absorbed. In the 1-8 μ m wavelength range, it has a high transmittance, which is the main operating band of silicon long wave pass filters. In the 8-14 μ m wavelength range, the transmittance begins to decrease due to the absorption of oxygen elements. In the field of optics, silicon long wave pass filters are applied in the manufacturing of special optical glass, fiber optic amplifiers, laser crystals, and infrared detectors.

Specifications

ParameterValue
Diameter8 inch
Thickness275-1000 μm
Orientation<110>
Substrate MaterialSilicon(Si)
Conductivity TypeN / P
Diameter Tolerance±0.2 mm
Thk Tolerance±10 mm
Orientation Tolerance±1°
Resistance10-1000 Ω.cm
TTV<10 μm
BOW<30 μm
WARP<30 μm
Transmission Range [Substrate Material:Silicon(Si)]1.2-15μm
Refractive Index [Substrate Material:Silicon(Si);@10μm]3.41776%@10μm
Reflection Loss [Substrate Material:Silicon(Si);@10μm]46.1%@10μm
Structure [Substrate Material:Silicon(Si)]Single crystal,synthetic
Cleavage Planes [Substrate Material:Silicon(Si)]<111>
Density [Substrate Material:Silicon(Si)]2.33 g/cm³
Melting Point [Substrate Material:Silicon(Si)]1414 ℃
Thermal Conductivity [Substrate Material:Silicon(Si);@313K]163 @ 313K
Thermal Expansion [Substrate Material:Silicon(Si);@293K]2.6 @ 293K
Knoop Hardness [Substrate Material:Silicon(Si)]1100 kg/mm²
Specific Heat Capacity [Substrate Material:Silicon(Si)]712.8 J/(kg×K)
Dielectric Constant [Substrate Material:Silicon(Si);@f= 9.37GHz]13 @f= 9.37GHz
Young's Modulus (E) [Substrate Material:Silicon(Si)]130.91 GPa
Shear Modulus(G) [Substrate Material:Silicon(Si)]79.92 GPa
Bulk Modulus(K) [Substrate Material:Silicon(Si)]101.97 GPa
Poisson Coefficient [Substrate Material:Silicon(Si)]0.266
Solubility [Substrate Material:Silicon(Si)]None
Molecular Weight [Substrate Material:Silicon(Si)]28.09 g/mol

Applications

Aerospace Light Path Infrared Light Source Laser External Optical Path Laser Light Source OPTICS Lens, 3D, machine vision Infrared Thermal Imaging Night Vision Shimmer Optoelectronic Infrared(EOIR) Medical Laser Laser Marking Laser Welding Laser Cutting Lidar Laser Illumination Laser Imaging Laser Gauge Light Source Detection Sensing Spectral Analysis Environmental Monitoring Agriculture and Food Industrial Process Analyzer Biomedical Fire Safety

Datasheet

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Supplier Information

Um
Umoptics
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UM OPTICS is located at No. 100 Light Industry Park, Chengguan Town, Shangcheng County, Xinyang City, Henan Province, China. It is a high-tech enterprise integrating material growth, component processing, coating and devices, with over 400 employees and a team of optical design, production R&D and technical experts, including 19 doctoral degree holders and over 15% scientific researchers. Its business covers all infrared materials including fluoride, Si, Ge, ZnS and ZnSe, forming a closed loop of the entire industry chain from crystal raw material preparation, crystal growth, initial processing of components, precision processing, coating to components. It has machining centers for flat, spherical and aspherical surfaces with an annual output of over 5 million optical lenses, and an annual production capacity of over 80 tons of fluoride and over 26 tons of silicon and germanium materials, providing customized low-stress, high-purity and high-uniformity infrared crystals to customers in over 60 countries and regions.

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