Advanced Thin Film Deposition System
The Advanced Thin Film Deposition System is designed for high-precision thin film coating applications, offering superior performance and reliability.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Film Thickness Uniformity | ≤±1% |
| Deposition Rate | Up to 10nm/min |
| Operating Temperature Range | 15°C-30°C |
| Vacuum Level | ≤10^-6 Torr |
| Substrate Size | Up to 300mm |
| Power Consumption | ≤10kW |
Applications
Key Features
Datasheet
Supplier Information
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