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Photonics Source provides 13 products. Download datasheets, request quotes, and compare function, price, and availability.
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Unknown
Unknown Parameter: Unknown -
IM4000 II & ArBlade 5000
Gas Source: 氩气 Gas Flow Control Method: 质量流量控制 Acceleration Voltage: IM4000 II: 0.0~6.0kV, ArBlade 5000: 0.0~8.0kV Vacuum System: 涡轮分子泵(67L/S)+机械泵(135L/min(50Hz), 162L/min(60Hz)) Main Unit Dimensions: IM4000 II: 616(W)×736(D)×312(H)mm, ArBlade 5000: 619(W)×736(D)×312(H)mm -
SU5000 Scanning Electron Microscope
Resolution 1.2nm@30kV(SE): 1.2nm Resolution 3.0nm@1kV(SE): 3.0nm Resolution 2.0nm@1kV(SE): 2.0nm Resolution 2.0nm@15kV(BSE): 2.0nm Magnification: 10–600,000× (low vacuum mode), 18–1,000,000× (800×600 image), 30–1,500,000× (1,280×960 image) -
PHEMOS-X
Main Unit Dimensions: 1656mm(W)×2000mm(H)×1247mm(D) Main Unit Weight: Approx.1640kg Operation Desk Dimensions 1: 1000mm(W)×700mm(H)×800mm(D) Operation Desk Weight 1: Approx.39.2kg Operation Desk Dimensions 2: 1480mm(W)×700mm(H)×800mm(D) -
SU8600 Series Scanning Electron Microscope
Secondary Electron Resolution: 0.6nm@15kV, 0.7nm@1kV Magnification: 20-2,000,000× Electron Gun: 冷阴极场发射枪, 支持技术间活动Function, Includes 低噪声模块系统 Acceleration Voltage: 0.01-30kV Detector: UD ExB混能滤波器, Includes SE/BSE信号 -
iNano®
Maximum Indentation Force: 50mN Indentation Depth Resolution: 0.01nm Force Resolution: 50nN Compliance Standards: ISO 14577 Sample Heating Temperature: 300°C -
iMicro
Maximum Load Range: 1000mN Maximum Resolution: 0.04μN Maximum Indentation Depth: 80μm Standard Mechanical Load Range: 1000mN Standard Mechanical Load Accuracy: 6nN -
Thermo 100
Model: Thermo 100 Dimensions: 1300*1094*2160mm Weight: Approx.600kg Voltage: AC220V Vacuum: >50kPa -
NanoFlip
Magnetic Force Sensor: InForce 50 Indentation Depth: up to 50μm Electromagnetic Force Range: 50mN Indentation Frequency: up to 100kHz International Standard: ISO 14577 -
Nano Indenter® G200X
Maximum Force: 1000mN Force Resolution: <1nN Displacement Resolution: <0.01nm Maximum Indentation Depth: 500μm Temperature range: Room temperature to 300°C -
FlexSEM 1000 II
Secondary Electron Resolution: 4.0nm (at 20kV, WD=5mm, high vacuum mode); 15.0nm (at 1kV, WD=5mm, high vacuum mode) Backscattered Electron Resolution: 5.0nm (at 20kV, WD=5mm, high vacuum mode) Magnification: ×5–×300,000 (low vacuum mode); ×16–×800,000 (high vacuum mode) Accelerating Voltage: 0.3kV–20kV Low Vacuum Range: 6–100Pa -
ETHOS NX5000
SIM Resolution (C,P): 4nm@30kV, 60nm@2kV (Edge resolution) Accelerating Voltage: 0.1kV–30kV Max Beam Current: 10nA Ion Source: Ga Liquid Metal Ion Source SEM Resolution (C,P): 1.5nm@1kV, 0.7nm@15kV SEM resolution at optimum Imaging WD -
光电Equipment
Dimensions: 1200x800x1800mm Weight: 500kg Power: 5kW Operating Temperature: 0-40°C Power Supply: 220V/50Hz