Current Category:
Subcategory:
Brand:
- Exfo
- ColorSpace
- Crystro
- EngWx
- Eoulu
- Fibretop
- Focuslight
- HbSais
- Inficon
- Innolite
- Keyence
- Koc
- KonicaMinolta
- Kyky
- Laserx
- Micro-Epsilon
- Mvotem
- PhenixOptics
- Slamtec
- Sri-I
- Ulirvision
- UlvacShanghai
- Uwlaser
- Vitalchem
- WekonTech
- Whhxykj
- WhPrecise
- Ybsemi-Solution
- Zzqsjm
- Burkert
- Trumpf
- OsakaVacuum
- NtiNanofilm
Photonics Source provides 744 products. Download datasheets, request quotes, and compare function, price, and availability.
-
High-Precision Coating System
Coating Uniformity: ≤0.5% Maximum Substrate Size: 300mm Cycle Time: ≤60s Power Consumption: ≤10kW Vacuum Level: ≤10^-6 Torr -
CERC-300
Processing Capacity: 300mm wafers Vacuum Level: High vacuum Control Accuracy: ±0.1% Dimensions: 2000mm x 1500mm x 2500mm Weight: 1500kg -
NLD-570
Dimensions: 1200mm x 1500mm x 1800mm Weight: 1500kg Power Requirements: AC200V, 50/60Hz, 3-phase Gas Flow Control Range: 0-500sccm Vacuum Level: 1x10^-6Pa -
Unknown
Dimensions: Unknown Weight: Unknown Power Consumption: Unknown Operating Temperature: Unknown Input Voltage: Unknown -
Dry Etching System NE-7800
Number of Chambers: 2 Processing Capability: High throughput Etching Precision: High Supported Materials: Various semiconductor materials Control System: Advanced automated control -
NE-7800 Dry Etching System
Number of Chambers: 2 Processing Capability: High-volume production Etching Precision: Sub-micron level Supported Materials: Various semiconductor materials Control System: Advanced automated control -
ULVAC Semiconductor Processing Equipment
Processing Capacity: High throughput Precision: Sub-micron level Compatibility: Supports various wafer sizes Energy Consumption: Optimized for low power usage Dimensions: Compact design for space efficiency -
Unknown
Dimensions: Unknown Power: Unknown Accuracy: Unknown -
IH-860 DISC
Working Pressure: 1×10^-3Pa Target Size: 8 inches Substrate Size: 3.5 inches Deposition Rate: 1.2nm/s Film Thickness Uniformity: ±2% -
CS-200
Operating Temperature: 15°C-30°C Power Requirements: AC200V, 50/60Hz Chamber Dimensions: 500mm x 500mm x 500mm Deposition Rate: 0.1nm/s-10nm/s Substrate Size: 200mm x 200mm -
DMS-300
Working Pressure: 1×10^-3 Pa Target Size: 300mm Deposition Rate: Up to 10nm/min Substrate Size: Up to 200mm Power Type: DC/RF -
DMS-700
Working Pressure: 1×10^-3 Pa Target Size: 200mm Deposition Rate: 1nm/s Substrate Size: 150mm Power Supply: 10kW -
CC-200
Operating Voltage: AC200V Power: 10kW Vacuum Degree: ≤1×10^-5Pa Chamber Size: 600mm x 600mm x 600mm Coating Speed: ≤5nm/s -
Model C16
Cooling Capacity: 16W Input Voltage: AC200V Frequency: 50/60Hz Power Consumption: 1.5kW Dimensions: 450mm x 600mm x 800mm -
LN2 Generator Model ENP-070V
Liquid Nitrogen Production: 70L/day Liquid Nitrogen Purity: 99.99% Power Consumption: 3.5kW Input Voltage: 200-240V Dimensions: 600mm x 800mm x 1800mm -
VD30 Rotary Vane Vacuum Pump
Pumping Speed: 30m³/h Ultimate Pressure: 6.7×10⁻²Pa Motor Power: 0.75kW Noise Level: 60dB Oil Capacity: 1.2L -
UTM Turbo Molecular Pump
Pumping Speed (L/s): 1000 Maximum Compression Ratio: 10^8 Operating Temperature (°C): 5-40 Power Requirements (V): 200-240 Weight (kg): 45 -
Sputter Ion Pump
Pumping Speed (Regeneration Pumping Speed) N2: 0.03m³/s (CU·AU), 0.02m³/s (1×10⁻⁷Pa时) Ultimate Pressure: 10⁻⁹Pa Operating Pressure: <8.0×10⁻³Pa (Recommended Value), Maximum Operating Pressure 1×10⁻²Pa Internal Volume: Approx. 6.7×10⁻⁴m³ Number of Pump Units: CU Type Cell×1, AV Type Cell×1 -
LLF-50A
Pumping Speed: 50L/s Ultimate Pressure: ≤1×10^-5Pa Power Supply: AC200V, 50/60Hz Power: 0.75kW Weight: 25kg -
Vacuum Pump Series
Maximum Exhaust Speed (m³/h) CR16B: ~20 Maximum Exhaust Speed (m³/h) CR30B: ~30 Maximum Exhaust Speed (m³/h) CR60B: ~60 Maximum Exhaust Speed (m³/h) CR300B: ~300 Maximum Exhaust Speed (m³/h) GR60A: ~60