Zr-Series Filter
Zr Filters Transmit13.5nm/Reject Other Bands,Heat-/Radiation-Loss-Resistant for Long-Term Research/Mass Production.
Specification Snapshot
Transmittance @13.5nm [Specification1; 13.5nm]
≥55%
Clear Aperture [Specification 1]
≤φ30mm
Transmittance @13.5nm [Specification2; 13.5nm]
≥35%
Clear Aperture [Specification 2]
≤φ50mm
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Overview
Zr Filters Transmit13.5nm/Reject Other Bands,Heat-/Radiation-Loss-Resistant for Long-Term Research/Mass Production.
Specifications
| Parameter | Value |
|---|---|
| Transmittance @13.5nm [Specification1; 13.5nm] | ≥55% |
| Clear Aperture [Specification 1] | ≤φ30mm |
| Transmittance @13.5nm [Specification2; 13.5nm] | ≥35% |
| Clear Aperture [Specification 2] | ≤φ50mm |
Applications
EUV Lithography:Selective Transmission Element for EUV Sources to Improve Exposure Accuracy;FEL:Band Selection/Beam Diagnostics;Astronomy:EUV Imaging/Spectroscopy for Improved SNR;Synchrotrons:Precision Band Selection in X-Ray/EUV Beamlines
Datasheet
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Supplier Information
Suzhou Hongce Optoelectronics Technology Co., Ltd., founded in August 2015, specializes in the R&D and production of precision optical nano-film devices and PVD coating equipment, covering wavelength ranges from infrared to X-ray and neutron optics, providing one-stop solutions. The company has mastered core technologies in short-wavelength optics such as EUV and X-ray, achieving domestic substitution. With multiple coating and testing equipment, it holds over 40 intellectual properties. Products include DUV/EUV lithography thin-film devices, laser films, multilayer Laue lenses (MLL), X-ray detection crystals, serving major national scientific platforms like lithography, synchrotron radiation, and elemental analysis.
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