Collimating Lens
A collimator converts divergent or irregular light into a parallel beam. 宏策光电's X-ray collimator uses special physical principles, mainly absorption and reflection, to select and guide a highly parallel beam from divergent polychromatic X-rays. It is designed for different energies, sources and incidence angles. For an 8keV Cu-target source, the stated average reflectance exceeds 60% over the relevant wavelength range at a 1.2° grazing-incidence angle at the mirror center.
Specification Snapshot
Substrate Material
Quartz, Monocrystalline Silicon, etc.
Operating Wavelength
Targeted Design Available
Reflectance
Determined by Wavelength and Incidence Angle
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Overview
A collimator converts divergent or irregular light into a parallel beam. 宏策光电's X-ray collimator uses special physical principles, mainly absorption and reflection, to select and guide a highly parallel beam from divergent polychromatic X-rays. It is designed for different energies, sources and incidence angles. For an 8keV Cu-target source, the stated average reflectance exceeds 60% over the relevant wavelength range at a 1.2° grazing-incidence angle at the mirror center.
Specifications
| Parameter | Value |
|---|---|
| Substrate Material | Quartz, Monocrystalline Silicon, etc. |
| Operating Wavelength | Targeted Design Available |
| Coating Design | Determined by Customized Wavelength |
| Reflectance | Determined by Wavelength and Incidence Angle |
| Angle of Incidence | Targeted Design Available |
Applications
Medical Imaging, Materials Analysis, Synchrotron Radiation Facilities, X-Ray Diffractometers
Datasheet
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Supplier Information
Suzhou Hongce Optoelectronics Technology Co., Ltd., founded in August 2015, specializes in the R&D and production of precision optical nano-film devices and PVD coating equipment, covering wavelength ranges from infrared to X-ray and neutron optics, providing one-stop solutions. The company has mastered core technologies in short-wavelength optics such as EUV and X-ray, achieving domestic substitution. With multiple coating and testing equipment, it holds over 40 intellectual properties. Products include DUV/EUV lithography thin-film devices, laser films, multilayer Laue lenses (MLL), X-ray detection crystals, serving major national scientific platforms like lithography, synchrotron radiation, and elemental analysis.
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