0°-193nm Laser High-Reflection Coating
宏策光电0°-193nm DUV Lithography/Excimer HR,Very High R/Low Absorption,Special UV Dielectrics,Dense/High-Energy/Laser Resistant for Long Pulsed High-Power Stable Normal Reflection.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Substrate | Quartz, Calcium Fluoride CaF2 and Other Materials |
| Dimensions | Customer Customization |
| Spectrum R [0° incidence; 193nm] | 0° Incidence, R>98%@193nm |
| Threshold [193nm] | >1J/cm2@193nm |
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Datasheet
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Supplier Information
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