HiPIMS sputter coating equipment HiPIMS-800
HiPIMS-800 combines all the advantages of conventional DC sputter coating systems with the capabilities of the latest HiPIMS technology. Six sputtering cathodes are installed, four operating in HIPIMS or DC mode. The other two DC cathodes can provide more complex multilayers, color and top coatings, or simply increase deposition rate. Fully free combinations of these technologies in one process provide a limited coating design range at very low production cost. In pure HiPIMS mode, the deposition rate is 2μm/h and processing takes 4-5 hours. With all 6 cathodes operating simultaneously, the rate reaches 3μm/h. This is an exceptionally short production time for a coating capacity stated as 1.800 round-shank tools or 5.000 indexable inserts. HiPIMS-800 can deposit all available HCVAC sputter coatings and nearly all PVD coatings on the market, and is ideal for custom process development. User-friendly 'Data View' and integrated 'Data Plan' tools help design individual coating solutions, distinguishing products and giving users a competitive advantage. Tablet and phone remote control, maintenance-friendly components, fully automatic cathode shutters, automatic door closure and rapid coating-table changes make HiPIMS-800 a state-of-the-art system for high-performance coating production and development. Integrated DLC coating technology. Main modules: Arc—innovative APA (Advanced Plasma Assisted) evaporator technology based on cathodic vacuum arcs opens possibilities for new layer structures. HiPIMS—high-power impulse magnetron sputtering. Other modules: sputtering—high-energy Ar ions bombard targets, releasing atoms into the gas phase; combining sputtered materials with other gases deposits coatings on substrates. Nitriding—plasma nitriding can precede PVD and/or PACVD coating in the same system and batch, creating a hardened support layer for subsequent PVD/PACVD coatings. DLC—diamond-like coatings are amorphous carbon coatings with ultra-low friction; the DLC module produces different coatings by PVD and/or PACVD, including metal-free or metal-containing carbon-based coatings. ta-C—hydrogen-free tetrahedral amorphous carbon refers to extremely hard, low-friction amorphous carbon coatings; the module produces different ta-C coatings.
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Overview
Specifications
| Parameter | Value |
|---|---|
| Coating range | Ø400mm x 400mm |
| Substrate table | Ø400mm xØ130mm x 6 |
| Rapid batch-change table | Optional |
| Sputtering cathode | 6 x 500 (including 4 optional HiPIMS/DC and another 2 DC; All cathodes fitted with shutters) |
| Maximum substrate dimensions Øx h | Ø400mm x 800mm |
| Drilling capacity Ø6 mm x 60 mm | 1800items |
| Insert capacity 12.7 mm x 3.5 mm | 4920items |
| Maximum workpiece weight | 250KG |
| Deposition rate [In pure HiPIMS mode] | 2 micrometers/hour. |
| Deposition rate [In DC or combi mode] | Up to 3 micrometers/hour. |
| Cycle time [Pure HiPIMS coating on a 10 mm milling cutter] | 4.5H |
| Process | HiPIMS and sputtering using booster technology. All established chlorofluorocarbon coatings are possible. |
| Substrate pretreatment (plasma etching) | Booster, MF and HiPIMS, etching |
| Conductive coating material | Yes |
| Non-conductive coating | Yes |
| Non-conductive substrate | Yes |
| Rated Power | 80Kw |
| Power consumption per batch for a 3-micrometer coating [Pure HiPIMS coating on a 10 mm milling cutter] | 120kWh |
| Dimensions | 1450mm x 3350mm x 2200mm |
| Weight | Approximately 3500Kg |
| Chamber-door closing | Automatic shutdown |
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Datasheet
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