Uses load-lock sputtering technology with modular combinations of RF, DC, HiPIMS high-power impulse magnetron sputtering and pulsed bias. The loading/unloading chamber accommodates five substrate trays, with automatic lifting and substrate transfer for higher productivity. Multiple cathodes can sputter simultaneously for multilayer coatings, with automatic process handling and data logging. Widely used in electronic component research and production to deposit metal or resistive films on ceramics, glass and metals, achieving complete through-hole coverage. TGV aspect ratio up to 15:1; TCV hole diameter 20um and aspect ratio 20:1.
| Parameter | Value |
| Cathode | Planar magnetron cathode/rotating cylindrical cathode |
| Power Supply | DC/DC pulse/MF/RF |
| Tray dimensions [Customizable] | L510xW515 (customizable) |
| Pumping system | Loading/unloading chamber: Roughing chamber: Roughing pump + turbomolecular pump; Coating chamber: Turbomolecular pump/cryopump |
| Heating System | Maximum 400°C |
| Uniformity | shi 1.2% (source wording) |
| Pressure holding | <0.1Pa |
| PVD copper thickness | Max.10um |
| Ultimate pressure | 3.0x10⁻⁵ Pa |
| Pump-down time [Down to 2.0 * 10⁻² Pa] | To 2.0 * 10⁻² Pa within 3min |
Applications: electrode deposition, multilayer electrodes and simultaneous deposition; dielectric films, insulating films, passivation and protective films. Electronic component research and small-scale production. Suitable for elemental metals such as Ti, Cu, Al, Cr, Ni, Ag and Sn, with widespread use in semiconductor electronic components.
Product advantages: customized TGV solutions for advanced packaging; TGV/TSV processes designed for conductive vias, insulating layers and seed layers; higher productivity with lower production costs; support for smaller dimensions and multilayer designs to accelerate technology upgrades; reliable heating control; mature magnetron sputtering technology.
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Guangdong Huicheng Vacuum Technology Co., Ltd. is a global vacuum application solution provider, engaged in the R&D, production and sales of optical coating equipment, functional thin film coating equipment, decorative coating equipment, roll-to-roll coating equipment, automotive parts coating equipment, continuous magnetron sputtering coating production lines, ultra-high vacuum systems and other vacuum equipment, ALD atomic layer deposition equipment, semiconductor equipment, electronic production equipment, optoelectronic equipment, photovoltaic equipment, power battery equipment and related accessories. It is a national high-tech enterprise focusing on the R&D and application of equipment and product-related manufacturing processes and application technologies, control software, process control software and related production automation software, and provides technology transfer, technical consulting and technical services.
The company was founded in 2006 and has hired senior experts and senior engineers in the domestic vacuum industry to specifically guide and be responsible for the R&D and design of new products. It has obtained multiple invention, design, utility model patents and copyrights, and was successfully listed on the ChiNext Board of the Shenzhen Stock Exchange in June 2024.
HCVAC provides complete thin film deposition solutions for precision optics, optoelectronics, new energy, flat panel display, semiconductors, power devices, tooling and molds, aviation, automotive, mobile phones, hardware and other markets. From R&D to prototyping and mass production, with core technology combinations such as evaporation, sputtering, PECVD, and ALD, we can provide practical production recommendations, R&D services and custom engineering to meet customers' personalized needs.
Focusing on cutting-edge fields such as semiconductors, new energy, 5G/6G communications, IoT sensors, and artificial intelligence (AI chip packaging/CoWoS), the company has set up four major laboratories: optical thin films, functional coatings, pan-semiconductors, and new materials. It works closely with customers to develop future equipment and processes, develops new film formation technologies through investment or cooperation, and continuously improves coating equipment.