High-precision multichamber magnetron sputtering optical coating equipment HCSO-1650T

RF-ICP/CCP-assisted magnetron sputtering with post-oxidation provides high deposition rates with matching optical performance.

AR deposition on automotive cover glass and 3C front cover glass, using conventional SiO2+Nb2O5 or hard SiO2+Si3N4 stacks. Also processes colored and gradient-color coatings and NCVM coatings on 3C rear covers. Application areas: head-up display vacuum coating; lidar vacuum coating; Face ID vacuum coating applications expanded in 2018; optical filter vacuum coating; optical lens vacuum coating; 3c product vacuum coating. Optical coating applications (HCSO-1650T): UV/IR cutoff filters, bandpass filters, RGB filters, lidar, AR, hard AR, hard coatings, HR, AS/AF, etc., compatible with 2D/3D substrates. Optical coating applications (HCSO-2550T): UV cutoff filters, AR, hard AR, hard coatings, HR, AS/AF, etc., compatible with 2D/3D substrates.

Excellent uniformity; supports different materials or higher throughput; integrated plasma source improves coating quality and precleans substrates; quick tool changes for different substrate sizes; high target utilization without compromising coating specifications; simple target exchange and accessible maintenance. Product advantages: high-density optical coatings without wavelength shift; highly reproducible intermediate-index coatings using mixed high- and low-index materials; precise composition and thickness control for functional coatings unattainable by evaporation; low-temperature deposition for varied uses; measures against particles from pumping and processing reduce maintenance and cleaning burdens; operation management supports real-time status monitoring and loss analysis. Advanced functions: rotating cathodes significantly improve target service life and utilization over conventional planar targets. Custom substrate racks maximize loading space. A fully automatic integrated lifting and lowering rack reduces door opening and closing time and improves productivity and process stability. Huicheng's patented ion source provides a wide operating range, balanced energy, high ionization rate, very stable efficiency and low energy consumption. Timed thickness control meets process requirements and saves quartz-crystal and optical monitoring steps and consumables. High-index nitride coatings improve hardness; low-temperature deposition supports varied uses. A patented gas-flow adjustment device maintains stable target voltage and coating quality. Optional external correction-plate adjustment mechanism. Main configuration (HCSO-1650T): fixture system: central rotation and revolution fixture drum / hanging-plate mechanical drive; pumping system: low-vacuum pump group + high-vacuum pump group + Polycold; vacuum control: vacuum controller, Penning and Pirani gauges; coating system: DC/MF magnetron sputtering source + ICP plasma source + inline AF/AS evaporation source; gas admission: MFC or APC automatic pressure controller; control system: PC+PLC. Main configuration (HCSO-2550T): fixture system: central rotation and revolution fixture drum / hanging-plate mechanical drive; pumping system: low-vacuum pump group + high-vacuum pump group + Polycold; vacuum control: vacuum controller, Penning and Pirani gauges; coating system: DC or MF magnetron sputtering source + plasma source + inline AF/AS evaporation source; gas admission: MFC or APC automatic pressure controller; control system: PC+PLC.