Home All Products Motion Control Encoders SUPERSCAN IV Series High-Dynamic Galvanometer Scanners SS IV-15
SUPERSCAN IV Series High-Dynamic Galvanometer Scanners SS IV-15
Encoders

SUPERSCAN IV Series High-Dynamic Galvanometer Scanners SS IV-15

Supplier
Sinteclaser
Part Number
SS IV-15
Category
Encoders
Origin
China

SUPERSCAN IV is a high-dynamic, high-speed digital galvanometer scanner using model-based digital regulation and PWM power output to reduce heat. It supports XY2‑100‑E Enhanced and SL2‑100 protocols. The main structure is water-cooled, and IV‑30 supports mirror purging. SOLAR is dedicated to photovoltaics/wafers and requires 48V power. Dynamic response is optimized for MOTF on-the-fly processing, with high configurations supporting laser power up to 6 kW. Model positioning and mirror coating/material and tuning configurations (not technical parameters): Model | SS IV-10 | SS IV-15 | SS IV SOLAR | SS IV-20 | SS IV-30 Product Positioning | High-end industrial applications | High-end industrial applications | High-end industrial applications （ Wafer / Photovoltaics ） | High-end industrial applications | High-end industrial applications 343 nm | — | — | SC（15 and 20 available for both ） | — | — 355 nm（ Ultraviolet ） | Si | QU | QU,SC (15) / SC (20) | QU | — 420–480 nm | — | — | — | — | QU 515 nm | — | — | SC（ only 15） | — | — 532 nm（ Green light ） | Si | QU,Si | QU,SC (15) / — (20) | QU,SC | — 900–1100 nm + AL | — | — | — | — | QU,SC 1020–1040 nm （>3 kW High power ） | — | — | — | — | QU 1030 / 1070 nm | — | SC | SC（ only 15） | — | — 1064 nm（ Fiber ） | Si | QU,Si,SC | QU,SC (15) / SC (20) | QU,SC | SI,SC,QU 1060–1080 nm | — | QU（ High-power coating ） | QU（ only 15） | — | QU（>3 kW High power ） 10.6 μm（CO₂） | — | Si,SC | — | Si,SC | Si,SC Optional Tuning | VC（ Vector ） M（ Micromachining ） | VC、C（ Cleaning ） H（ Hatching ） | PL（ High linearity ） W（ Wafer ） | VC（ Other options available ） | VC（ Fast vector ） FV（ High-dynamic fast vector ）

Specification Snapshot
Operating Temperature
+15~+35 ℃
Storage Temperature
−10~+60 ℃
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Overview

SUPERSCAN IV is a high-dynamic, high-speed digital galvanometer scanner using model-based digital regulation and PWM power output to reduce heat. It supports XY2‑100‑E Enhanced and SL2‑100 protocols. The main structure is water-cooled, and IV‑30 supports mirror purging. SOLAR is dedicated to photovoltaics/wafers and requires 48V power. Dynamic response is optimized for MOTF on-the-fly processing, with high configurations supporting laser power up to 6 kW. Model positioning and mirror coating/material and tuning configurations (not technical parameters): Model | SS IV-10 | SS IV-15 | SS IV SOLAR | SS IV-20 | SS IV-30 Product Positioning | High-end industrial applications | High-end industrial applications | High-end industrial applications （ Wafer / Photovoltaics ） | High-end industrial applications | High-end industrial applications 343 nm | — | — | SC（15 and 20 available for both ） | — | — 355 nm（ Ultraviolet ） | Si | QU | QU,SC (15) / SC (20) | QU | — 420–480 nm | — | — | — | — | QU 515 nm | — | — | SC（ only 15） | — | — 532 nm（ Green light ） | Si | QU,Si | QU,SC (15) / — (20) | QU,SC | — 900–1100 nm + AL | — | — | — | — | QU,SC 1020–1040 nm （>3 kW High power ） | — | — | — | — | QU 1030 / 1070 nm | — | SC | SC（ only 15） | — | — 1064 nm（ Fiber ） | Si | QU,Si,SC | QU,SC (15) / SC (20) | QU,SC | SI,SC,QU 1060–1080 nm | — | QU（ High-power coating ） | QU（ only 15） | — | QU（>3 kW High power ） 10.6 μm（CO₂） | — | Si,SC | — | Si,SC | Si,SC Optional Tuning | VC（ Vector ） M（ Micromachining ） | VC、C（ Cleaning ） H（ Hatching ） | PL（ High linearity ） W（ Wafer ） | VC（ Other options available ） | VC（ Fast vector ） FV（ High-dynamic fast vector ）

Specifications

ParameterValue
Supply Voltage30 V or 48 V
Current2 A RMS， maximum 5 A
Ripple / Noise [20 MHz]≤200 mVpp @20 MHz
InterfaceDigital XY2-100-E Enhanced + SL2-100
Operating Temperature+15~+35 ℃
Storage Temperature−10~+60 ℃
Humidity [Noncondensing]≤80%
ProtectionIP64
Typical Deflection Angle±0.393 rad
Resolution [XY2-100-E；16 bit]12 μrad
Resolution [SL2-100；20 bit]0.76 μrad
Repeatability [RMS]<2.0 μrad
Position Noise [RMS]<4.5 μrad
Temperature Drift — Gain15 ppm/K
Temperature Drift — Position10 μrad/K
h Long-Term Drift (without Water Cooling) [8 h; without water cooling]<60 μrad
h Long-Term Drift (with Water Cooling) [8 h; with water cooling]<40 μrad
Input Aperture15 mm
Beam Displacement18.1 (QU/SI) / 18.0 (SC)
Weight (Without Lens) [Without a lens]≈3.2 kg
External Form L×W×H170 mm × 125 mm × 117.5 mm
Processing / Positioning Speed [@30 V / @48 V]QU-VC：45/50 QU-C：—/200 SI-VC：50/65 SC-VC：55/75 SC-H：30/30
Tracking ErrorQU-VC：0.19 QU-C：0.30 SI-VC：0.16 SC-VC：0.14 SC-H：0.12
1% Step ResponseQU-VC：0.49 QU-C：0.65 SI-VC：0.43 SC-VC：0.37 SC-H：0.47
Examples of Linear Speed across the Working Field12.2 m/s（SC，75 rad/s） 12.7 m/s（QU，f=254 mm）
Water Cooling✓

Applications

MOTF on-the-fly marking and dynamic processing Scribing, perforating, and cutting plastic films and paper in the packaging industry High-speed marking of electronic components Photovoltaic silicon wafer scribing Remote laser welding Industrial laser processing requiring high-speed scanning and high dynamic response

Key Features

Model-based digital adjustment and PWM power output reduce power consumption and overall heating. Supports both XY2‑100‑E enhanced (16bit) and SL2‑100 (20bit) protocols. Excellent dynamic response optimized specifically for MOTF on-the-fly processing. Water-cooled main structure; optional mirror air purge for SS‑IV‑30. VC / M / C / H / FV / W / PL tuning options cover vector processing, cleaning, filling, wafer and photovoltaic processing. The SOLAR photovoltaic version is optimized for silicon wafer scribing and supports only + 48 V power. A wide range of mirror substrates and coatings accommodates ultraviolet, green, fiber, and CO₂ laser wavelengths.

Datasheet

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Supplier Information

Si
Sinteclaser
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Wuhan Sintec Optoelectronics Technology Co., Ltd. is a high-tech enterprise and a specialized and sophisticated 'Little Giant' enterprise at the upstream of the domestic laser industry chain. The company focuses on the R&D, manufacturing, sales and service of lasers and laser accessories. Its main products include femtosecond lasers, picosecond lasers, acousto-optic modulators, optical components, etc., widely used in laser equipment manufacturing, scientific research and other fields. Located in Wuhan Optical Valley, with a modern industrial park, the company provides one-stop personalized services for the laser industry, with customers all over China and products exported overseas.

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