Hot silk chemical phase deposition equipment HFCVD0606
The CVD vacuum chamber has an independent double-wall water-cooled structure for efficient, uniform cooling and stable operation. Dual doors, multiple viewports and expansion ports accept infrared thermometry, spectroscopy, video monitoring and thermocouples. Accessible design simplifies maintenance, configuration changes and upgrades. Features: 1. Gas delivery uses mass-flow controllers, solenoid valves and mixing tanks for precise flow, uniform mixing and safe isolation. Optional carrier-gas components support liquid carbon precursors or liquid boron sources for conductive-diamond electrodes. 2. Quiet rotary-vane pumping and turbomolecular pumping establish high-vacuum background. A combined resistance/ionization gauge and capacitance-diaphragm gauges cover different process-gas pressures. A precision proportional valve automatically controls deposition pressure. 3. Multibranch cooling measures pressure, flow and temperature with automatic software monitoring. Independent cooling circuits and individual valves simplify fault diagnosis and safe operation. 4. A large LCD HMI and PLC enable automatic control, recipe editing/import, trend display and automatic equipment/process archiving for traceability and analysis. 5. A servo raises/lowers the substrate stage; graphite or copper stages are available, with thermocouple temperature measurement. 6. Integral or split frames meet transport needs. 7. Separate module panels open or detach quickly for access. Hot-filament CVD grows diamond coatings and freestanding thick films, micro/nanocrystalline and conductive diamond. Applications include wear protection on carbide tools; heat-dissipation coatings for silicon, silicon-carbide and other semiconductor materials/devices; and boron-doped conductive-diamond electrodes for electrolytic ozone disinfection or wastewater treatment.
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Specifications
| Parameter | Value |
|---|---|
| Internal size | φ600*H600(mm) |
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